Walter Riess

Ambipolar light-emitting organic field-effect transistor

We demonstrate a light-emitting organic field-effect transistor (OFET) with pronounced ambipolar current characteristics. The ambipolar transport layer is a coevaporated thin film of α-quinquethiophene (α-5T) as hole-transport material and N,N′-ditridecylperylene-3,4,9,10-tetracarboxylic diimide (P13) as electron-transport material. The light intensity is controlled by both the drain–source voltage VDS and the gate voltage VG. Moreover, the latter can be used to adjust the charge-carrier balance. The device structure serves as a model system for ambipolar light-emitting OFETs and demonstrates the general concept of adjusting electron and hole mobilities by coevaporation of two different organic semiconductors.

Toward Nanowire Electronics

This paper discusses the electronic transport properties of nanowire field-effect transistors (NW-FETs). Four different device concepts are studied in detail: Schottky-barrier NW-FETs with metallic source and drain contacts, conventional-type NW-FETs with doped NW segments as source and drain electrodes, and, finally, two new concepts that enable steep turn-on characteristics, namely, NW impact ionization FETs and tunnel NW-FETs. As it turns out, NW-FETs are, to a large extent, determined by the device geometry, the dimensionality of the electronic transport, and the way of making contacts to the NW. Analytical as well as simulation results are compared with experimental data to explain the various factors impacting the electronic transport in NW-FETs.

Transient and steady-state behavior of space charges in multilayer organic light-emitting diodes

A numerical study of space charge effects in multilayer organic light-emitting diodes (OLEDs) is presented. The method of solving the coupled Poisson and continuity equations, previously established for single-layer polymer LEDs, has been extended to treat internal organic interfaces. In addition, we consider the transient current and electroluminescence response. We discuss the accumulation of charges at internal interfaces and their signature in the transient response as well as the electric field distribution. Comparison to experimental transient data of a typical bilayer LED based on tris(8-hydroxyquinolinato)aluminum (Alq3) is provided and good agreement is found. Our results are consistent with commonly assumed operating principles of bilayer LEDs. In particular, the assumptions that the electric field is predominantly dropped across the Alq3 layer and that the electroluminescence delay time is determined by electrons passing through Alq3 to the internal interface are self-consistently supported by ...

Donor deactivation in silicon nanostructures

The operation of electronic devices relies on the density of free charge carriers available in the semiconductor; in most semiconductor devices this density is controlled by the addition of doping atoms. As dimensions are scaled down to achieve economic and performance benefits, the presence of interfaces and materials adjacent to the semiconductor will become more important and will eventually completely determine the electronic properties of the device. To sustain further improvements in performance, novel field-effect transistor architectures, such as FinFETs and nanowire field-effect transistors, have been proposed as replacements for the planar devices used today, and also for applications in biosensing and power generation. The successful operation of such devices will depend on our ability to precisely control the location and number of active impurity atoms in the host semiconductor during the fabrication process. Here, we demonstrate that the free carrier density in semiconductor nanowires is dependent on the size of the nanowires. By measuring the electrical conduction of doped silicon nanowires as a function of nanowire radius, temperature and dielectric surrounding, we show that the donor ionization energy increases with decreasing nanowire radius, and that it profoundly modifies the attainable free carrier density at values of the radius much larger than those at which quantum and dopant surface segregation effects set in. At a nanowire radius of 15 nm the carrier density is already 50% lower than in bulk silicon due to the dielectric mismatch between the conducting channel and its surroundings.

Silicon nanowire tunneling field-effect transistors

We demonstrate the implementation of tunneling field-effect transistors (TFETs) based on silicon nanowires (NWs) that were grown using the vapor-liquid-solid growth method. The Si NWs contain p-i-n+ segments that were achieved by in situ doping using phosphine and diborane as the n- and p-type dopant source, respectively. Electrical measurements of the TFETs show a band-to-band tunneling branch in the transfer characteristics. Furthermore, an increase in the on-state current and a decrease in the inverse subthreshold slope upon reducing the gate oxide thickness are measured. This matches theoretical calculations using a Wenzel Kramer Brillouin approximation with nanowire diameter and oxide thickness as input parameters.

Simulating electronic and optical processes in multilayer organic light-emitting devices

A detailed investigation of the device operation of a blue-emitting multilayer organic light-emitting device (OLED) using an electronic device model is presented. In particular, a transient electroluminescence overshoot at turn-on is found to originate from charge and recombination confinement effects at internal interfaces. The location of the emission zone is obtained from the electronic model and its experimental determination exemplified by a sensing layer method. Moreover, the optimization of emission intensity and color is discussed for a red-emitting OLED. The thin-film interference effects are analyzed with help of an optical device model.

Vertical surround-gated silicon nanowire impact ionization field-effect transistors

One of the fundamental limits in the scaling of metal oxide semiconductor field-effect transistor technology is the room-temperature (RT) limit of ∼60mV/decade in the inverse subthreshold slope. Here, the authors demonstrate vertical integration of a single surround-gated silicon nanowire field-effect transistor with an inverse subthreshold slope as low as 6mV/decade at RT that spans four orders of magnitude in current. Operation of the device is based on avalanche breakdown in a partially gated vertical nanowire, epitaxially grown using the vapor-liquid-solid method. Low-power logic based on impact ionization field-effect transistors in combination with a vertical architecture is very promising for future high-performance ultrahigh-density circuits.

Patterned epitaxial vapor-liquid-solid growth of silicon nanowires on Si(111) using silane

We have carried out a detailed study on the vapour-liquid-solid growth of silicon nanowires (SiNWs) on (111)-oriented Si substrates using Au as catalytic seed material. Arrays of individual seeds were patterned by electron-beam lithography, followed by Au evaporation and lift-off. SiNWs were grown using diluted silane as precursor gas in a low-pressure chemical vapor deposition system. The silane partial pressure, substrate temperature, and seed diameter were systematically varied to obtain the growth rate of the NWs and the rate of sidewall deposition. Activation energies of 19kcal∕mol for the axial SiNW growth and 29kcal∕mol for the radial deposition on the SiNW surface are derived from the data. SiNW growth at elevated temperatures is accompanied by significant Au surface diffusion, leading to a loss of Au from the tips of the SiNWs that depends on the layout and density of the Au seeds patterned. In contrast to NWs grown from a thin-film-nucleated substrate, the deterministic patterning of identical A...

Doping Limits of Grown in situ Doped Silicon Nanowires Using Phosphine

Structural characterization and electrical measurements of silicon nanowires (SiNWs) synthesized by Au catalyzed vapor-liquid-solid growth using silane and axially doped in situ with phosphine are reported. We demonstrate that highly n-doped SiNWs can be grown without structural defects and high selectivity and find that addition of the dopant reduces the growth rate by less than 8% irrespective of the radius. This indicates that also the dopant incorporation is radius-independent. On the basis of electrical measurements on individual wires, contact resistivities as low as 1.2 x 10(-7) omega cm(-2) were extracted. Resistivity measurements reveal a reproducible donor incorporation of up to 1.5 x 1020 cm-3 using a gas phase ratios of Si/P = 1.5 x 10(-2). Higher dopant gas concentrations did not lead to an increase of the doping concentration beyond 1.5 x10(20) cm(-3).

Outperforming the Conventional Scaling Rules in the Quantum-Capacitance Limit

We present a study on the scaling behavior of field- effect transistors in the quantum-capacitance limit (QCL). It will be shown that a significant performance improvement in terms of the power delay product can be obtained in devices scaled toward the QCL. As a result, nanowires or nanotubes exhibiting a 1-D transport are a premier choice as active channel materials for transistor devices since the QCL can be attained in such systems.