Weon-Guk Kim
KAIST
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Publication
Featured researches published by Weon-Guk Kim.
Scientific Reports | 2018
Jun-Young Park; Weon-Guk Kim; Hagyoul Bae; Ik Kyeong Jin; Da-Jin Kim; Hwon Im; Il-Woong Tcho; Yang-Kyu Choi
Microwave-induced thermal curing is demonstrated to improve the reliability and to prolong the lifetime of chips containing nanoscale electron devices. A film containing graphite powder with high microwave absorbing efficiency was fabricated at low cost. The film is flexible, bendable, foldable, and attachable to a chip. A commercial off-the-shelf chip and a representative 3-dimensional (3D) metal-oxide-semiconductor field-effect transistor (MOSFET), known as FinFET, were utilized to verify the curing behaviors of the microwave-induced heat treatment. The heat effectively cured not only total ionizing dose (TID) damage from the external environment, but also internal electrical stress such as hot-carrier injection (HCI), which are representative sources of damages in MOSFET insulators. Then, the characteristics of the pre- and post-curing electron devices are investigated using electrical measurements and numerical simulations.
international electron devices meeting | 2016
Dae-Won Kim; Weon-Guk Kim; Ik Kyeong Jin; Hongkeun Park; Moo Jin Kwak; Sung Gap Im; Yang-Kyu Choi
A thickness effect of a tribo-dielectric layer (TDL) made of ultra-thin polymer in a triboelectric energy harvester (TEH) is experimentally and comprehensively studied. The TDL was deposited by the initiated chemical vapor deposition (i-CVD) method and its thickness was precisely controlled to analyze the thickness effect. The correlation between the thickness of the TDL and the output performance is experimentally determined and analytically understood with the aid of the dynamic contact-separation model. In contrast to the conventional static contact-separation model, in this case the output performance increases as the thickness of the TDL increases owing to the dynamic behavior of the electron, which includes drift and recombination phenomenon in the TDL.
Nano Energy | 2016
Weon-Guk Kim; Il-Woong Tcho; Dae-Won Kim; Seung-Bae Jeon; Sang-Jae Park; Myeong-Lok Seol; Yang-Kyu Choi
Nano Energy | 2017
Il-Woong Tcho; Weon-Guk Kim; Seung-Bae Jeon; Sang-Jae Park; Boung Ju Lee; Hee-Kyoung Bae; Daewon Kim; Yang-Kyu Choi
Nano Energy | 2017
Daewon Kim; Il-Woong Tcho; Ik Kyeong Jin; Sang-Jae Park; Seung-Bae Jeon; Weon-Guk Kim; Han-Saem Cho; Heung-Soon Lee; Sae Chae Jeoung; Yang-Kyu Choi
Nano Energy | 2017
Seung-Bae Jeon; Young-Hoon Nho; Sang-Jae Park; Weon-Guk Kim; Il-Woong Tcho; Daewon Kim; Dong-Soo Kwon; Yang-Kyu Choi
Advanced Energy Materials | 2018
Weon-Guk Kim; Daewon Kim; Seung-Bae Jeon; Sang-Jae Park; Il‐ Woong Tcho; Ik‐Kyeong Jin; Joon-Kyu Han; Yang-Kyu Choi
Nano Energy | 2018
Il-Woong Tcho; Seung-Bae Jeon; Sang-Jae Park; Weon-Guk Kim; Ik Kyeong Jin; Joon-Kyu Han; Daewon Kim; Yang-Kyu Choi
Nano Energy | 2018
Ik Kyeong Jin; Jun-Young Park; Byung-Hyun Lee; Seung-Bae Jeon; Il-Woong Tcho; Sang-Jae Park; Weon-Guk Kim; Joon-Kyu Han; Seung-Wook Lee; Seong-Yeon Kim; Hagyoul Bae; Daewon Kim; Yang-Kyu Choi
Nano Energy | 2018
Seung-Bae Jeon; Sang-Jae Park; Weon-Guk Kim; Il-Woong Tcho; Ik‐Kyeong Jin; Joon-Kyu Han; Daewon Kim; Yang-Kyu Choi