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Dive into the research topics where Yasuhiro Omura is active.

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Featured researches published by Yasuhiro Omura.


Optical Microlithography XVII | 2004

Nikon projection lens update

Tomoyuki Matsuyama; Toshiro Ishiyama; Yasuhiro Omura

This paper describes various kinds of technological improvements in ArF projection lenses for success in very low-k1 and high NA lithography. This paper covers optical design, lens manufacturing, aberration characterization, aberration manipulation, flare control, and linear polarizing illumination. Actual lens performance of the Nikon NSR-S307E (0.85NA ArF Optics) is also reviewed.


Archive | 2007

Projection optical system and method for photolithography and exposure apparatus and method using same

Yasuhiro Omura; Hironori Ikezawa


Archive | 2006

Projection optical system, exposure apparatus, and exposure method

Yasuhiro Omura


Archive | 1997

Catadioptric system for photolithography

Tetsuo Takahashi; Yasuhiro Omura


Archive | 2001

Projection optical system, manufacturing method thereof, and projection exposure apparatus

Tetsuo Takahashi; Jin Nishikawa; Yasuhiro Omura


Archive | 2002

Production method of projection optical system

Youhei Fujishima; Hironori Ikezawa; Toshihiko Ozawa; Yasuhiro Omura; Takeshi Suzuki


Archive | 2000

Projection exposure methods and apparatus, and projection optical systems

Yasuhiro Omura


Archive | 2002

PROJECTION OPTICAL SYSTEM, PROJECTION EXPOSURE APPARATUS HAVING THE PROJECTION OPTICAL SYSTEM, PROJECTION METHOD THEREOF, EXPOSURE METHOD THEREOF AND FABRICATING METHOD FOR FABRICATING A DEVICE USING THE PROJECTION EXPOSURE APPARATUS

Yasuhiro Omura


Archive | 2002

Projection optical system and an exposure apparatus with the projection optical system

Yasuhiro Omura; Naomasa Shiraishi; Issey Tanaka; Soichi Owa; Toshihiko Ozawa; Shunsuke Niisaka


Archive | 2001

Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices

Yasuhiro Omura; Naomasa Shiraishi; Soichi Owa

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