Yasuo Shimamura | Researchain

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Archive | 1989

COATING LIQUID FOR FORMING SILICA FILM, PREPARATION OF SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR DEVICE

Hiroyuki Morishima; Tonobu Sato; Yasuo Shimamura; Shunichiro Uchimura

Archive | 1989

ELECTROPHOTOGRAPHIC MEMBER CONTAINING A FLUORINE-CONTAINING LUBRICATING AGENT AND PROCESS FOR PRODUCING THE SAME

Fuminori Ishikawa; Kunihiro Tamahashi; Shigeharu Onuma; Masatoshi Wakagi; Masanobu Hanazono; Mitsuyoshi Shoji; Takayuki Nakakawaji; Yutaka Ito; Shigeki Komatsuzaki; Yasuo Shimamura; Chiaki Yamagishi

Archive | 1992

Coating fluid for forming oxide film and production of oxide film

Hiroyuki Morishima; Nintei Sato; Yasuo Shimamura; 任廷佐藤; 泰夫島村; 浩之森嶋

Archive | 1990

Production of coating fluid for forming silica film, coating fluid for forming silica film, production of silica film, silica film, and semiconductor device coated with silica film

Hiroyuki Morishima; Tonobu Sato; Yasuo Shimamura; Shunichiro Uchimura

Archive | 2004

Cmp abrasive for semiconductor insulation film and its manufacturing method, and method of polishing substrate

Masato Fukazawa; Fumiko Hida; Naoyuki Koyama; Hiroto Otsuki; Yasuo Shimamura; 裕人大槻; 直之小山; 泰夫島村; 正人深沢; 文子飛田

Archive | 1996

COATING LIQUID FOR SILICA-BASED FILM FORMATION, ITS PRODUCTION, SILICA-BASED FILM AND SEMICONDUCTOR DEVICE

Hiroyuki Morishima; Shigeru Nobe; Yasuo Shimamura; Yasuhiro Yamamoto; 靖浩山本; 泰夫島村; 浩之森嶋; 茂野部

Archive | 1989

Impurity diffusing liquid for semiconductor element and manufacture of impurity diffusion layer using same liquid

Hiroyuki Morishima; Yasuo Shimamura; Shunichiro Uchimura

Archive | 1989

COATING LIQUID FOR FORMING OXIDE COATING FILM AND METHOD FOR FORMING OXIDE COATING FILM

Hiroyuki Morishima; Tonobu Sato; Yasuo Shimamura; Shunichiro Uchimura

Archive | 1992

COATING FLUID FOR FORMATION OF OXIDE COATING FILM AND FORMATION OF OXIDE COATING FILM

Hiroyuki Morishima; Nintei Sato; Yasuo Shimamura; Shunichiro Uchimura; Yasuhiro Yamamoto; 任廷佐藤; 俊一郎内村; 靖浩山本; 泰夫島村; 浩之森嶋

Archive | 1989

Electrophotographic member and process for producing the same.

Fuminori Ishikawa; Kunihiro Tamahashi; Shigeharu Onuma; Masatoshi Wakagi; Masanobu Hanazono; Mitsuyoshi Shoji; Takayuki Nakakawaji; Yutaka Ito; Shigeki Komatsuzaki; Yasuo Shimamura; Chiaki Yamagishi

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