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Chiaki Yamagishi

Hitachi

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Publication

Featured researches published by Chiaki Yamagishi.

Archive | 2004

Cmp polishing compound and polishing method

Masato Fukasawa; Masato Yoshida; Naoyuki Koyama; Yuto Ootsuki; Chiaki Yamagishi; Kazuhiro Enomoto; Kouji Haga; Yasushi Kurata

Archive | 1996

Polyimides and optical parts obtained by using the same

Chiaki Yamagishi; Nori Sasaki; Shigeo Nara; Hidetaka Sato; Shigeru Hayashida; Masato Taya

Archive | 2007

CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method, and Semiconductor Electronic Part Polished by the Polishing Method

Masato Fukasawa; Kazuhiro Enomoto; Chiaki Yamagishi; Naoyuki Koyama

Archive | 1989

ELECTROPHOTOGRAPHIC MEMBER CONTAINING A FLUORINE-CONTAINING LUBRICATING AGENT AND PROCESS FOR PRODUCING THE SAME

Fuminori Ishikawa; Kunihiro Tamahashi; Shigeharu Onuma; Masatoshi Wakagi; Masanobu Hanazono; Mitsuyoshi Shoji; Takayuki Nakakawaji; Yutaka Ito; Shigeki Komatsuzaki; Yasuo Shimamura; Chiaki Yamagishi

Archive | 2007

Cmp abrasive for polishing insulating film, polishing method and semiconductor electronic component polished by such polishing method

Masato 深沢 正人 Fukasawa; Kazuhiro Enomoto; Chiaki Yamagishi; Naoyuki 小山 直之 Koyama

Archive | 1990

Electrophotographic photosensitive element, method of making it and electrophotographic apparatus including it

Fuminori Ishikawa; Shigeharu Onuma; Masatoshi Wakagi; Kunihiro Tamahashi; Masanobu Hanazono; Mitsuyoshi Syoji; Takayuki Nakakawaji; Yutaka Ito; Shigeki Komatsuzaki; Chiaki Yamagishi

Archive | 1989

Electrophotographic member and process for producing the same.

Fuminori Ishikawa; Kunihiro Tamahashi; Shigeharu Onuma; Masatoshi Wakagi; Masanobu Hanazono; Mitsuyoshi Shoji; Takayuki Nakakawaji; Yutaka Ito; Shigeki Komatsuzaki; Yasuo Shimamura; Chiaki Yamagishi

Archive | 2007

CMP POLISHING SLURRY, ADDITIVE LIQUID FOR CMP POLISHING SLURRY, AND SUBSTRATE-POLISHING PROCESSES USING THE SAME

Masato Fukasawa; Chiaki Yamagishi; Tadahiro Kimura; Toshiaki Akutsu

Archive | 2007

CMP POLISHING AGENT, ADDITIVE SOLUTION FOR CMP POLISHING AGENT, AND METHOD FOR POLISHING SUBSTRATE BY USING THE POLISHING AGENT AND THE ADDITIVE SOLUTION

Masato Fukasawa; Chiaki Yamagishi; Tadahiro Kimura; Toshiaki Akutsu

Archive | 2007

絶縁膜研磨用ｃｍｐ研磨剤、研磨方法、該研磨方法で研磨された半導体電子部品

Masato Fukasawa; Kazuhiro Enomoto; Chiaki Yamagishi; Naoyuki Koyama

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Collaboration

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Masato Fukasawa

Hitachi

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Kazuhiro Enomoto

Hitachi

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Fuminori Ishikawa

Hitachi

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Hidetaka Sato

Hitachi

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Kunihiro Tamahashi

Hitachi

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Masanobu Hanazono

Hitachi

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Masato Taya

Hitachi

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Masatoshi Wakagi

Hitachi

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Nori Sasaki

Hitachi

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Shigeharu Onuma

Hitachi

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