Chiaki Yamagishi | Researchain

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Archive | 2004

Cmp polishing compound and polishing method

Masato Fukasawa; Masato Yoshida; Naoyuki Koyama; Yuto Ootsuki; Chiaki Yamagishi; Kazuhiro Enomoto; Kouji Haga; Yasushi Kurata

Archive | 1996

Polyimides and optical parts obtained by using the same

Chiaki Yamagishi; Nori Sasaki; Shigeo Nara; Hidetaka Sato; Shigeru Hayashida; Masato Taya

Archive | 2007

CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method, and Semiconductor Electronic Part Polished by the Polishing Method

Masato Fukasawa; Kazuhiro Enomoto; Chiaki Yamagishi; Naoyuki Koyama

Archive | 1989

ELECTROPHOTOGRAPHIC MEMBER CONTAINING A FLUORINE-CONTAINING LUBRICATING AGENT AND PROCESS FOR PRODUCING THE SAME

Fuminori Ishikawa; Kunihiro Tamahashi; Shigeharu Onuma; Masatoshi Wakagi; Masanobu Hanazono; Mitsuyoshi Shoji; Takayuki Nakakawaji; Yutaka Ito; Shigeki Komatsuzaki; Yasuo Shimamura; Chiaki Yamagishi

Archive | 2007

Cmp abrasive for polishing insulating film, polishing method and semiconductor electronic component polished by such polishing method

Masato 深沢正人 Fukasawa; Kazuhiro Enomoto; Chiaki Yamagishi; Naoyuki 小山直之 Koyama

Archive | 1990

Electrophotographic photosensitive element, method of making it and electrophotographic apparatus including it

Fuminori Ishikawa; Shigeharu Onuma; Masatoshi Wakagi; Kunihiro Tamahashi; Masanobu Hanazono; Mitsuyoshi Syoji; Takayuki Nakakawaji; Yutaka Ito; Shigeki Komatsuzaki; Chiaki Yamagishi

Archive | 1989

Electrophotographic member and process for producing the same.

Fuminori Ishikawa; Kunihiro Tamahashi; Shigeharu Onuma; Masatoshi Wakagi; Masanobu Hanazono; Mitsuyoshi Shoji; Takayuki Nakakawaji; Yutaka Ito; Shigeki Komatsuzaki; Yasuo Shimamura; Chiaki Yamagishi

Archive | 2007