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Dive into the research topics where Yasushi Akiyama is active.

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Featured researches published by Yasushi Akiyama.


Proceedings of SPIE, the International Society for Optical Engineering | 2009

Latest developments in photosensitive developable bottom anti-reflective coating (DBARC)

Takanori Kudo; Srinivasan Chakrapani; Alberto D. Dioses; Edward Ng; Charito Antonio; Deepa Parthasarathy; Shinji Miyazaki; Yuki Ubayashi; Kazuma Yamamoto; Yasushi Akiyama; Richard Collett; Mark Neisser; Munirathna Padmanaban

Developable bottom anti-reflective coatings (DBARC) are an emerging litho material technology. The biggest advantage of DBARC is that it eliminates the plasma etch step, avoiding damage to plasma sensitive layers during implantation. AZ has pioneered developable BARC based on photosensitive cleave as well as crosslink/decrosslink mechanisms. In this paper, we focus on the crosslink/decrosslink concept. DBARC/resist mismatching was corrected both from process and formulation sides. The optimized DBARC showed comparable lithographic performance as conventional BARCs. This paper provides the chemical concept of the photosensitive developable DBARCs, approaches for DBARC/resist matching and performance of photosensitive DBARCs for 248 nm and 193 nm exposures. Recent 193 nm immersion exposure results are also presented.


Archive | 2003

Composition for antireflection coating and method for forming pattern

Yasushi Akiyama; Yusuke Takano


Archive | 2005

Composition for antireflection coating and method for forming pattern using same

Jirou Matsuo; Kiyofumi Takano; Yusuke Takano; Yasushi Akiyama


Archive | 2014

Composition for forming a developable bottom antireflective coating

Shigemasa Nakasugi; Kazuma Yamamoto; Yasushi Akiyama; Shinji Miyazaki; Munirathna Padmanaban; Srinivasan Chakrapani


Journal of Photopolymer Science and Technology | 2014

Directed Self-assembly of Topcoat-free, Integration-friendly High-χ Block Copolymers

Ankit Vora; Anindarupa Chunder; Melia Tjio; Srinivasan Balakrishman; Elizabeth Lofano; Joy Cheng; Daniel P. Sanders; Eri Hirahara; Yasushi Akiyama; Orest Polishchuk; Margareta Paunescu; Durairaj Baskaran; SungEun Hong; Guanyang Lin


Journal of Photopolymer Science and Technology | 2010

Advances and Challenges in Developable Bottom Anti-Reflective Coating (DBARC)

Takanori Kudo; Srinivasan Chakrapani; Alberto D. Dioses; Edward Ng; Charito Antonio; Deepa Parthasarathy; Shinji Miyazaki; Kazuma Yamamoto; Yasushi Akiyama; Richard Collett; Mark Neisser; Murirathna Padmanaban


Archive | 2008

COMPOSITION FOR FORMATION OF TOP ANTI-REFLECTIVE FILM, AND PATTERN FORMATION METHOD USING THE COMPOSITION

Go Noya; Yasushi Akiyama; Yusuke Takano


Archive | 2007

COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM AND PATTERN FORMATION METHOD USING THE SAME

Katsutoshi Kuramoto; Masakazu Kobayashi; Yasushi Akiyama


Archive | 2006

Composition for forming reflection prevention film and method of forming pattern using the same

Yasushi Akiyama; Masaichi Kobayashi; Katsutoshi Kuramoto; Takeshi Noya; Ryuta Shimazaki


Archive | 2002

Development defect preventing process and composition used in the same

Yasushi Akiyama; Seion Ko; Tetsuo Okayasu; Kiyohisa Takahashi; Yusuke Takano; 岡安 哲雄; 洪 聖恩; 秋山 靖; 高橋 清久; 高野 祐輔

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Go Noya

AZ Electronic Materials

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Edward Ng

AZ Electronic Materials

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Jirou Matsuo

AZ Electronic Materials

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Mark Neisser

AZ Electronic Materials

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