Yeonsang Park

A mechanically enhanced storage node for virtually unlimited height (MESH) capacitor aiming at sub 70nm DRAMs

Fully reliable lean-free stacked capacitor, with the meshes of the supporter made of Si/sub 3/N/sub 4/, has been successfully developed on 80nm COB DRAM application. This novel process terminates persistent problems caused by mechanical instability of storage node with high aspect ratio. With Mechanically Enhanced Storage node for virtually unlimited Height (MESH), the cell capacitance over 30fF/cell has been obtained by using conventional MIS dielectric with an equivalent 2.3nm oxide thickness. This inherently lean-free capacitor makes it possible extending the existing MIS dielectric technology to sub-70nm OCS (one cylindrical storage node) DRAMs.

Large Work Function Modulation of Monolayer MoS2 by Ambient Gases

Although two-dimensional monolayer transition-metal dichalcogenides reveal numerous unique features that are inaccessible in bulk materials, their intrinsic properties are often obscured by environmental effects. Among them, work function, which is the energy required to extract an electron from a material to vacuum, is one critical parameter in electronic/optoelectronic devices. Here, we report a large work function modulation in MoS2 via ambient gases. The work function was measured by an in situ Kelvin probe technique and further confirmed by ultraviolet photoemission spectroscopy and theoretical calculations. A measured work function of 4.04 eV in vacuum was converted to 4.47 eV with O2 exposure, which is comparable with a large variation in graphene. The homojunction diode by partially passivating a transistor reveals an ideal junction with an ideality factor of almost one and perfect electrical reversibility. The estimated depletion width obtained from photocurrent mapping was ∼200 nm, which is much narrower than bulk semiconductors.

Tunable Metamaterials for Controlling THz Radiation

Remarkable progress in terahertz (THz) sources and detectors is followed by the necessity of manipulating of terahertz radiation. Since natural materials can not perform efficient interaction with THz radiation, artificial structures called metamaterials are designed to overcome “THz gap” in this area. A variety of tunable metamaterials using different methods of control are presented and discussed in this review paper.

Optical Gain in MoS2 via Coupling with Nanostructured Substrate: Fabry-Perot Interference and Plasmonic Excitation

Despite the direct band gap of monolayer transition metal dichalcogenides (TMDs), their optical gain remains limited because of the poor light absorption in atomically thin, layered materials. Most approaches to improve the optical gain of TMDs mainly involve modulation of the active materials or multilayer stacking. Here, we report a method to enhance the optical absorption and emission in MoS2 simply through the design of a nanostructured substrate. The substrate consisted of a dielectric nanofilm spacer (TiO2) and metal film. The overall photoluminescence intensity from monolayer MoS2 on the nanostructured substrate was engineered based on the TiO2 thickness and amplified by Fabry-Perot interference. In addition, the neutral exciton emission was selectively amplified by plasmonic excitations from the local field originating from the surface roughness of the metal film with spacer thicknesses of less than 10 nm. We further demonstrate that the quality factor of the device can also be engineered by selecting a spacer material with a different refractive index.

Modulation of the Dirac point voltage of graphene by ion-gel dielectrics and its application to soft electronic devices.

We investigated systematic modulation of the Dirac point voltage of graphene transistors by changing the type of ionic liquid used as a main gate dielectric component. Ion gels were formed from ionic liquids and a non-triblock-copolymer-based binder involving UV irradiation. With a fixed cation (anion), the Dirac point voltage shifted to a higher voltage as the size of anion (cation) increased. Mechanisms for modulation of the Dirac point voltage of graphene transistors by designing ionic liquids were fully understood using molecular dynamics simulations, which excellently matched our experimental results. It was found that the ion sizes and molecular structures play an essential role in the modulation of the Dirac point voltage of the graphene. Through control of the position of their Dirac point voltages on the basis of our findings, complementary metal-oxide-semiconductor (CMOS)-like graphene-based inverters using two different ionic liquids worked perfectly even at a very low source voltage (V(DD) = 1 mV), which was not possible for previous works. These results can be broadly applied in the development of low-power-consumption, flexible/stretchable, CMOS-like graphene-based electronic devices in the future.

Direct observation of enhanced cathodoluminescence emissions from ZnO nanocones compared with ZnO nanowire arrays

We report, for the first time, direct observation of enhanced cathodoluminescence (CL) emissions from ZnO nanocones (NCs) compared with ZnO nanowires (NWs). For direct and unambiguous comparison of CL emissions from NWs and nanocones, periodic arrays of ZnO NW were converted to nanocone arrays by our unique HCl [aq] etching technique, enabling us to compare the CL emissions from original NWs and final nanocones at the same location. CL measurements on NW and nanocone arrays reveal that emission intensity of the nanocone at ∼ 387 nm is over two times larger than that of NW arrays. The enhancement of CL emission from nanocones has been confirmed by finite-difference time-domain simulation of enhanced light extraction from ZnO nanocones compared to ZnO NWs. The enhanced CL from nanocones is attributed to its sharp morphology, resulting in more chances of photons to be extracted at the interface between ZnO and air.

Novel robust cell capacitor (Leaning Exterminated Ring type Insulator) and new storage node contact (Top Spacer Contract) for 70nm DRAM technology and beyond

For the first time, novel robust capacitor (Leaning exterminated Ring type Insulator - LERI) and new storage node (SN) contact process (Top Spacer Contact - TSC) are successfully developed with 82nm feature size. These novel processes drastically improved electrical characteristics such as cell capacitance, parasitic bit line capacitance and cell contact resistance, compared to a conventional process. The most pronounced effect using the LERI in COB structure is to greatly improve cell capacitance without twin bit failure. In addition, the TSC technology has an ability to remove a critical ArF lithography. By using the LERI and TSC processes in 82nm 512M DDR DRAM, the cell capacitance of 32fF/cell is achieved with Toxeq of 2.3nm and the parasitic bit line capacitance is reduced by 20%, resulted in great improvement of tRCD (1.5ns).

Photonic Crystal Phosphors Integrated on a Blue LED Chip for Efficient White Light Generation

Following the proof-of-concept experiment in the unit structure level, photonic crystal (PhC) phosphors-structurally engineered phosphor materials based on the nanophotonics principles-are integrated with a blue light-emitting diode (LED) chip to demonstrate a compact and efficient white light source. Red- or green-emitting CdSe-based colloidal quantum dots (CQDs) are coated on a Si3 N4 thin-film grating to fabricate PhC phosphors. The underlying PhC structure is designed such that the photonic band-edge modes at the zone center (k∣∣ = 0) are tuned to the energy of the blue excitation photons. By progressively stacking the PhC phosphor plates on a blue LED chip, the blue, green, and red emission intensities can be tightly controlled to obtain white light with the desired properties. The chromaticity coordinates, (0.332, 0.341), and correlated color temperature, 5500 K, are obtained from a stack of 3 red and 11 green PhC phosphor plates; in contrast, a stack of 5 red and 16 green reference phosphor plates are required to generate a similar white light. Overall, the PhC phosphors produce 8% higher total emission intensity out of 33% less amount of CQDs than the reference phosphors.

A novel robust TiN/AHO/TiN capacitor and CoSi/sub 2/ cell pad structure for 70nm stand-alone and embedded DRAM technology and beyond

For the first time, a novel robust (square-shape cylinder type) TiN/AHO (Al/sub 2/O/sub 3/-HfO/sub 2/)/TiN capacitor with Co-silicide on landing cell pad suitable for both stand-alone and embedded DRAMs are successfully developed with 88nm (pitch 176nm) feature size, which is the smallest feature size ever reported in DRAM technology, using ArF lithography for aiming 70nm stand-alone and embedded DRAM technology. The capacitor with Toxeq of 1.5nm and leakage current of less than 1 fA/cell is achieved. The cell contact resistance is greatly improved by using Co-silicidation on landing cell pad and metal storage node contact plug, which results in high performance.

Radiation direction control by optical slot antenna integrated with plasmonic waveguide

We present an optical slot antenna integrated with a metal-dielectric-metal (MIM) plasmonic waveguide. By integrating optical slot antenna on top metal layer of MIM waveguide, we can couple the plasmon guide mode into the feed antenna directly. The resonantly excited slot antenna works as a magnetic dipole and then radiates in dipole-like far-field pattern. By adding an auxiliary groove structure along with the slot antenna, the radiation can be directed into the direction where the structure determined. The demonstrated optical slot antenna integrated with a plasmonic waveguide can be used as a “plasmonic via” in plasmonic nanocircuits.