Yoshihiko Kudo | Researchain

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Featured researches published by Yoshihiko Kudo.

Archive | 2004

Exposure method, substrate stage, exposure apparatus and method for manufacturing device

Soichi Owa; Nobutaka Magome; Shigeru Hirukawa; Yoshihiko Kudo; Jiro Inoue; Hirotaka Kohno; Masahiro Nei; Motokatsu Imai; Hiroyuki Nagasaka; Kenichi Shiraishi; Yasufumi Nishii; Hiroaki Takaiwa

Archive | 2008

Exposure method, substrate stage, exposure apparatus, and device manufacturing method

Soichi Owa; Nobutaka Magome; Shigeru Hirukawa; Yoshihiko Kudo; Jiro Inoue; Hirotaka Kohno; Masahiro Nei; Motokatsu Imai; Hiroyuki Nagasaka; Kenichi Shiraishi; Yasufumi Nishii; Hiroaki Takaiwa

Archive | 2008

Moving body apparatus, apparatus for forming pattern, method of forming pattern, method of producing device, method of producing moving body apparatus, and method of driving moving body

Yasuo Aoki; Hiroshi Shirasu; Yoshihiko Kudo

Archive | 2009

Movable body apparatus, pattern forming apparatus and pattern forming method, device manufacturing method, manufacturing method of movable body apparatus, and movable body drive method

Yasuo Aoki; Hiroshi Shirasu; Yoshihiko Kudo

Archive | 2013

Mobile device and patterning device, and mobile driving method

Yasuo Aoki; 保夫青木; Hiroshi Shirasu; 廣白数; Yoshihiko Kudo; 芳彦工藤

Archive | 2012

Substrate stage, exposure device, and device manufacturing method

Soichi Yamato; 壮一大和; Nobutaka Umagome; 伸貴馬込; Shigeru Hirukawa; 茂蛭川; Yoshihiko Kudo; 芳彦工藤; Jiro Inoue; 次郎井上; Hirotaka Kono; 博高河野; Masahiro Nei; 正洋根井; Motomasa Imai; 基勝今井; Hiroyuki Nagasaka; 博之長坂; Kenichi Shiraishi; 健一白石; Yasufumi Nishii; 康文西井; Hiroaki Takaiwa; 宏明高岩

Archive | 2010

Photolithography method, substrate stage, photolithography machine, and method of manufacturing device

Shigeru Hirukawa; Motomasa Imai; Jiro Inoue; Hirotaka Kono; Yoshihiko Kudo; Hiroyuki Nagasaka; Masahiro Nei; Yasufumi Nishii; Kenichi Shiraishi; Hiroaki Takaiwa; Nobutaka Umagome; Soichi Yamato; 次郎井上; 基勝今井; 壮一大和; 芳彦工藤; 正洋根井; 博高河野; 健一白石; 茂蛭川; 康文西井; 博之長坂; 伸貴馬込; 宏明高岩

Archive | 2016

WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LISTExposure method, substrate stage, exposure apparatus, and device manufacturing method

Soichi Owa; Nobutaka Magome; Shigeru Hirukawa; Yoshihiko Kudo; Jiro Inoue; Hirotaka Kohno; Masahiro Nei; Motokatsu Imai; Hiroyuki Nagasaka; Kenichi Shiraishi; Yasufumi Nishii; Hiroaki Takaiwa

Archive | 2015

The substrate stage

大和壮一; Soichi Yamato; 壮一大和; 伸貴馬込; Nobutaka Umagome; 茂蛭川; Shigeru Hirukawa; 芳彦工藤; Yoshihiko Kudo; 井上次郎; Jiro Inoue; 次郎井上; 博高河野; Hirotaka Kono; 正洋根井; Masahiro Nei; 今井基勝; Motomasa Imai; 基勝今井; 長坂博之; Hiroyuki Nagasaka; 博之長坂; 健一白石; Kenichi Shiraishi; 康文西井; Yasufumi Nishii; 宏明高岩; Hiroaki Takaiwa

Archive | 2012