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Dive into the research topics where Yoshihiko Kudo is active.

Publication


Featured researches published by Yoshihiko Kudo.


Archive | 2004

Exposure method, substrate stage, exposure apparatus and method for manufacturing device

Soichi Owa; Nobutaka Magome; Shigeru Hirukawa; Yoshihiko Kudo; Jiro Inoue; Hirotaka Kohno; Masahiro Nei; Motokatsu Imai; Hiroyuki Nagasaka; Kenichi Shiraishi; Yasufumi Nishii; Hiroaki Takaiwa


Archive | 2008

Exposure method, substrate stage, exposure apparatus, and device manufacturing method

Soichi Owa; Nobutaka Magome; Shigeru Hirukawa; Yoshihiko Kudo; Jiro Inoue; Hirotaka Kohno; Masahiro Nei; Motokatsu Imai; Hiroyuki Nagasaka; Kenichi Shiraishi; Yasufumi Nishii; Hiroaki Takaiwa


Archive | 2008

Moving body apparatus, apparatus for forming pattern, method of forming pattern, method of producing device, method of producing moving body apparatus, and method of driving moving body

Yasuo Aoki; Hiroshi Shirasu; Yoshihiko Kudo


Archive | 2009

Movable body apparatus, pattern forming apparatus and pattern forming method, device manufacturing method, manufacturing method of movable body apparatus, and movable body drive method

Yasuo Aoki; Hiroshi Shirasu; Yoshihiko Kudo


Archive | 2013

Mobile device and patterning device, and mobile driving method

Yasuo Aoki; 保夫 青木; Hiroshi Shirasu; 廣 白数; Yoshihiko Kudo; 芳彦 工藤


Archive | 2012

Substrate stage, exposure device, and device manufacturing method

Soichi Yamato; 壮一 大和; Nobutaka Umagome; 伸貴 馬込; Shigeru Hirukawa; 茂 蛭川; Yoshihiko Kudo; 芳彦 工藤; Jiro Inoue; 次郎 井上; Hirotaka Kono; 博高 河野; Masahiro Nei; 正洋 根井; Motomasa Imai; 基勝 今井; Hiroyuki Nagasaka; 博之 長坂; Kenichi Shiraishi; 健一 白石; Yasufumi Nishii; 康文 西井; Hiroaki Takaiwa; 宏明 高岩


Archive | 2010

Photolithography method, substrate stage, photolithography machine, and method of manufacturing device

Shigeru Hirukawa; Motomasa Imai; Jiro Inoue; Hirotaka Kono; Yoshihiko Kudo; Hiroyuki Nagasaka; Masahiro Nei; Yasufumi Nishii; Kenichi Shiraishi; Hiroaki Takaiwa; Nobutaka Umagome; Soichi Yamato; 次郎 井上; 基勝 今井; 壮一 大和; 芳彦 工藤; 正洋 根井; 博高 河野; 健一 白石; 茂 蛭川; 康文 西井; 博之 長坂; 伸貴 馬込; 宏明 高岩


Archive | 2016

***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***Exposure method, substrate stage, exposure apparatus, and device manufacturing method

Soichi Owa; Nobutaka Magome; Shigeru Hirukawa; Yoshihiko Kudo; Jiro Inoue; Hirotaka Kohno; Masahiro Nei; Motokatsu Imai; Hiroyuki Nagasaka; Kenichi Shiraishi; Yasufumi Nishii; Hiroaki Takaiwa


Archive | 2015

The substrate stage

大和 壮一; Soichi Yamato; 壮一 大和; 伸貴 馬込; Nobutaka Umagome; 茂 蛭川; Shigeru Hirukawa; 芳彦 工藤; Yoshihiko Kudo; 井上 次郎; Jiro Inoue; 次郎 井上; 博高 河野; Hirotaka Kono; 正洋 根井; Masahiro Nei; 今井 基勝; Motomasa Imai; 基勝 今井; 長坂 博之; Hiroyuki Nagasaka; 博之 長坂; 健一 白石; Kenichi Shiraishi; 康文 西井; Yasufumi Nishii; 宏明 高岩; Hiroaki Takaiwa


Archive | 2012

基板ステージ、露光装置、及びデバイス製造方法

Soichi Yamato; 壮一 大和; Nobutaka Umagome; 伸貴 馬込; Shigeru Hirukawa; 茂 蛭川; Yoshihiko Kudo; 芳彦 工藤; Jiro Inoue; 次郎 井上; Hirotaka Kono; 博高 河野; Masahiro Nei; 正洋 根井; Motomasa Imai; 基勝 今井; Hiroyuki Nagasaka; 博之 長坂; Kenichi Shiraishi; 健一 白石; Yasufumi Nishii; 康文 西井; Hiroaki Takaiwa; 宏明 高岩

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