Yoshihiro Koyama

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Photomask and next-generation lithography mask technology. Conference | 2001

Ryoji Hagiwara; Anto Yasaka; Osamu Takaoka; Tomokazu Kozakai; Satoru Yabe; Yoshihiro Koyama; Masashi Muramatsu; Toshio Doi; Katsumi Suzuki; Mamoru Okabe; Kazuo Aita; Tatsuya Adachi; Shinji Kubo; Nobuyuki Yoshioka; Hiroaki Morimoto; Yasutaka Morikawa; Kazuya Iwase; Naoya Hayashi

The satisfactory data have been confirmed on the photomask repairing performance for 100nm-node/ArF-generation lithography with the model SIR5000 photomask repair system. In this report, the repairing ability is presented with transmittance and edge placement data. The edge placement was almost 15nm(3sigma) on binary and MoSi-HT masks, and there isn’t any transmittance loss in the AIMS193 data.

Proceedings of SPIE, the International Society for Optical Engineering | 2006

Fumio Aramaki; Tomokazu Kozakai; Masashi Muramatsu; Yasuhiko Sugiyama; Yoshihiro Koyama; Osamu Matsuda; Katsumi Suzuki; Mamoru Okabe; Toshio Doi; Ryoji Hagiwara; Tatsuya Adachi; Anto Yasaka; Yoshiyuki Tanaka; Osamu Suga; Naoki Nishida; Youichi Usui

Yasutoshi Itou, Yoshiyuki Tanaka, Osamu Suga *Yasuhiko Sugiyama, *Ryoji Hagiwara, *Haruo Takahashi, *Osamu Takaoka, *Tomokazu Kozakai, *Osamu Matsuda, *Katsumi Suzuki, *Mamoru Okabe, *Syuichi Kikuchi, *Atsushi Uemoto, *Anto Yasaka, *Tatsuya Adachi, **Naoki Nishida Semiconductor Leading Edge Technologies, Inc. 16-1, Onogawa, Tsukuba-shi, Ibaraki, 305-8569, Japan *SII NanoTechnorogy Inc. 36-1 Takenoshita, Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan **HOYA Co. 1375 Kawaguchi-cho, Hachioji-shi, Tokyo, 193-8525, Japan

Archive | 1994