Yoshihiro Koyama
Seiko Instruments
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Publication
Featured researches published by Yoshihiro Koyama.
Photomask and next-generation lithography mask technology. Conference | 2001
Ryoji Hagiwara; Anto Yasaka; Osamu Takaoka; Tomokazu Kozakai; Satoru Yabe; Yoshihiro Koyama; Masashi Muramatsu; Toshio Doi; Katsumi Suzuki; Mamoru Okabe; Kazuo Aita; Tatsuya Adachi; Shinji Kubo; Nobuyuki Yoshioka; Hiroaki Morimoto; Yasutaka Morikawa; Kazuya Iwase; Naoya Hayashi
The satisfactory data have been confirmed on the photomask repairing performance for 100nm-node/ArF-generation lithography with the model SIR5000 photomask repair system. In this report, the repairing ability is presented with transmittance and edge placement data. The edge placement was almost 15nm(3sigma) on binary and MoSi-HT masks, and there isn’t any transmittance loss in the AIMS193 data.
Proceedings of SPIE, the International Society for Optical Engineering | 2006
Fumio Aramaki; Tomokazu Kozakai; Masashi Muramatsu; Yasuhiko Sugiyama; Yoshihiro Koyama; Osamu Matsuda; Katsumi Suzuki; Mamoru Okabe; Toshio Doi; Ryoji Hagiwara; Tatsuya Adachi; Anto Yasaka; Yoshiyuki Tanaka; Osamu Suga; Naoki Nishida; Youichi Usui
Yasutoshi Itou, Yoshiyuki Tanaka, Osamu Suga *Yasuhiko Sugiyama, *Ryoji Hagiwara, *Haruo Takahashi, *Osamu Takaoka, *Tomokazu Kozakai, *Osamu Matsuda, *Katsumi Suzuki, *Mamoru Okabe, *Syuichi Kikuchi, *Atsushi Uemoto, *Anto Yasaka, *Tatsuya Adachi, **Naoki Nishida Semiconductor Leading Edge Technologies, Inc. 16-1, Onogawa, Tsukuba-shi, Ibaraki, 305-8569, Japan *SII NanoTechnorogy Inc. 36-1 Takenoshita, Oyama-cho, Sunto-gun, Shizuoka, 410-1393, Japan **HOYA Co. 1375 Kawaguchi-cho, Hachioji-shi, Tokyo, 193-8525, Japan
Archive | 1994
Tatsuya Adachi; Takashi Kaito; Yoshihiro Koyama; Kouji Iwasaki
Archive | 1999
Yoshihiro Koyama; Kazuo Aita
Archive | 1997
Yoshihiro Koyama; Yasuhiko Sugiyama
Archive | 2003
Yoshihiro Koyama; Osamu Takaoka; 喜弘 小山; 修 高岡
Archive | 2000
Ryoji Hagiwara; Yoshihiro Koyama
Archive | 2003
Yoshihiro Koyama
Archive | 1999
Ryoji Hagiwara; Yoshihiro Koyama; 喜弘 小山; 良二 萩原
Photomask and X-Ray Mask Technology II | 1995
Kazuo Aita; Yoshihiro Koyama; Hiroshi Matsumura; Takashi Kaito; Yasushi Satoh; Katsuhide Tsuchiya; Shigeru Noguchi
