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Dive into the research topics where Yoshiho Amada is active.

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SPIE'S 1993 Symposium on Microlithography | 1993

Stability of krypton fluoride laser in real stepper mode operation

Masahiko Kowaka; Yukio Kobayashi; Osamu Wakabayashi; Noritoshi Ito; Junichi Fujimoto; Takanobu Ishihara; Hiroaki Nakarai; Hakaru Mizoguchi; Yoshiho Amada; Yasuhiro Nozue

The stable performance of the line-narrowed Krypton Fluoride Excimer Laser for production steppers, the KLES-G6, in real stepper mode operation is presented. Wavelength stability of < +/- 0.1 pm and pulse-to-pulse energy stability of < 2% ((sigma) ) were achieved in the real stepper mode operation. Further the durability test was made at 6 W(10 mJ, 600 Hz) in 1 sec. ON - 1 sec. OFF (50%) burst mode and in cw mode. The central wavelength stability < +/- 0.2 pm including the drift at the head of burst, spectral bandwidth < 1.5 pm, and pulse-to-pulse energy stability < 2.5% ((sigma) ) over 1.6 X 109 shots were achieved. The KLES-G6 will assist us to utilize the excimer stepper in real commercial production successfully.


Optical/Laser Microlithography V | 1992

Narrow band KrF excimer laser for mass production of ULSI ICs

Hakaru Mizoguchi; Osamu Wakabayashi; Noritoshi Ito; Masahiko Kowaka; Junichi Fujimoto; Yukio Kobayashi; Takanobu Ishihara; Yoshiho Amada; Yasuhiro Nozue

A narrow band KrF excimer laser system for lithography has been developed. Its durability has been proved up to 2 billion shots that correspond to one year operation in mass production line. The system has kept the average power of 6W with the power stability within +- 3% and the spectral line-width 1.2 pm (FWHM) with the wavelength stability within +- 0.2 pm. The integration of the spectrum has indicated that 95% of the spectral energy lay inside 4.6 pm band during 2 billion shots


SPIE's 1994 Symposium on Microlithography | 1994

Recent advances of a KrF excimer laser on a plant's practical requirements

Yukio Kobayashi; Takanobu Ishihara; Hiroaki Nakarai; Noritoshi Ito; Tomokazu Takahashi; Osamu Wakabayashi; Hakaru Mizoguchi; Yoshiho Amada; Junichi Fujimoto; Masahiko Kowaka; Yasuhiro Nozue

In this paper we describe the performance of the newest model of line-narrowed KrF excimer laser KLES-G6 (1995 model) developed in factory on the practical requirements. The KLES- G6 exhibits: (1) spectral bandwidth < 0.8 pm; (2) wavelength stability < +/- 0.1 pm; (3) pulse-to-pulse energy stability < 1.8% ((sigma) ); (4) output power equals 6 W at 600 Hz; (5) gas life > 100 million pulses or 7 days; (6) window cleaning or exchange > 1 billion pulses; (7) laser chamber exchange > 2 billion pulses; (8) mean time between failures > 1500 hours; (9) running cost per a billion pulses is about 29 thousand dollars. These advanced performances will save the running cost and guarantee the high uptime ratio needed to satisfy the plants practical requirements.


Archive | 1994

Apparatus for controlling output of an excimer laser device

Noritoshi Ito; Yoshiho Amada; Osamu Wakabayashi


Archive | 2001

Excimer laser apparatus

Junichi Fujimoto; Hakaru Mizoguchi; Yoshiho Amada; Osamu Wakabayashi


Archive | 1988

Laser wavelength control apparatus

Yoshiho Amada; Osamu Wakabayashi; Masahiko Kowaka


Archive | 1992

Laser device having an electrode with auxiliary conductor members

Hakaru Mizoguchi; Yoshiho Amada; Noritoshi Ito


Archive | 1994

Output controller for laser device

Yoshiho Amada; Osamu Wakabayashi; Noritoshi Ito


Archive | 1988

Apparatus for controlling laser wavelength

Osamu Wakabayashi; Yasuo Itakura; Masahiko Kowaka; Yoshiho Amada


Archive | 1988

Device for controlling wavelength of laser beam

Yoshiho Amada; Osamu Wakabayashi; Masahiko Kowaka

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