Yoshimasa Ohshima | Researchain

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Archive | 2005

Apparatus and method for testing defects

Minori Noguchi; Yoshimasa Ohshima; Hidetoshi Nishiyama; Shunichi Matsumoto; Yukio Kembo; Ryouji Matsunaga; Keiji Sakai; Takanori Ninomiya; Tetsuyai Watanabe; Hisato Nakamura; Takahiro Jingu; Yoshio Morishige; Shuichi Chikamatsu

Archive | 1991

Method and apparatus for inspecting foreign particles on real time basis in semiconductor mass production line

Hiroshi Morioka; Minori Noguchi; Yoshimasa Ohshima; Yukio Kembo; Yuzo Taniguchi

Archive | 1991

Method and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production process

Minori Noguchi; Yukio Kembo; Hiroshi Morioka; Hiroshi Yamaguchi; Makiko Kohno; Yoshimasa Ohshima

Archive | 1999

Optical apparatus for defect and particle size inspection

Minori Noguchi; Yoshimasa Ohshima; Hidetoshi Nishiyama; Shunichi Matsumoto; Yukio Kembo; Ryouji Matsunaga; Keiji Sakai; Takanori Ninomiya; Tetsuya Watanabe; Hisato Nakamura; Takahiro Jingu; Yoshio Morishige; Shuichi Chikamatsu

Archive | 2012

Inspection method and inspection apparatus

Akira Hamamatsu; Minori Noguchi; Hidetoshi Nishiyama; Yoshimasa Ohshima; Takahiro Jingu; Sachio Uto

Archive | 1990

Method of and apparatus for detecting foreign substances

Mitsuyoshi Koizumi; Yoshimasa Ohshima

Archive | 1984

Method of detecting pattern defect and its apparatus

Yasuhiko Hara; Yoshimasa Ohshima; Satoru Fushimi; Hiroshi Makihira

Archive | 2002

Semiconductor device inspection method

Akira Hamamatsu; Minori Noguchi; Yoshimasa Ohshima; Hidetoshi Nishiyama

Archive | 2006

Method of inspecting a semiconductor device and an apparatus thereof

Akira Hamamatsu; Minori Noguchi; Yoshimasa Ohshima; Hidetoshi Nishiyama; Kenji Oka; Takanori Ninomiya; Maki Tanaka; Kenji Watanabe; Tetsuya Watanabe; Yoshio Morishige

Archive | 2003