Youichi Ishimura
Mitsubishi
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Publication
Featured researches published by Youichi Ishimura.
ieee industry applications society annual meeting | 2002
Junji Yamada; Yoshiharu Yu; Youichi Ishimura; John F. Donlon; E.R. Motto
A new 5th generation IGBT module with low turn-off energy has been developed. The module utilizes IGBT chips optimized for high frequency industrial power supplies in applications such as X-ray, MRI (magnetic resonance imaging), and induction heating. This technology is designed to provide a simplified cost effective alternative to parallel discrete MOSFETs in these applications.
international symposium on power semiconductor devices and ic's | 1995
H. Takahashi; Youichi Ishimura; C. Yokoyama; Hiroyasu Hagino; T. Yamada
An advanced IGBT with a new n+buffer structure has been developed. The new n+buffer structure is that some n+buried layers are formed at the boundary between a p+substrate and a n+buffer layer. The concentration of the n+buried layers is almost the same as that of the p+substrate. The fabrication of the IGBT with the new n+buffer structure used a 3rd gen 600 V/100 A chip. Taking the VVVF inverter as an application, total power loss generated was about 12% less compared to the conventional IGBT, only changing the n+buffer structure. And the short circuit safe operating area of the new IGBT was almost similar to the conventional IGBT. Moreover, we discussed differences between the new IGBT and the conventional IGBT using a 3D simulator, DAVINCI.
applied power electronics conference | 2002
Eric R. Motto; John F. Donlon; T. Nakagawa; Youichi Ishimura; Katsumi Satoh; Junji Yamada; Masanori Yamamoto; Shigeru Kusunoki; Hideki Nakamura; Katsumi Nakamura
This paper describes a new 1700 V power device based on a wide cell pitch carrier stored trench bipolar transistor (CSTBT). The new chip also utilizes a light punch through (LPT) vertical structure that is produced using low cost single crystal (nonepitaxial) wafer material. The device is optimized to provide the best trade-off between losses and ruggedness for industrial power conversion applications. A new gate process that enhances the reliability of the gate isolation film is another key technology utilized in the development of this device. The new 1700 V device demonstrates the successful extension of technologies previously used for 1200 V CSTBT devices to higher blocking voltages.
international symposium on power semiconductor devices and ic's | 2002
Katsumi Nakamura; Shigeru Kusunoki; Hideki Nakamura; Youichi Ishimura; Yoshifumi Tomomatsu; Tadaharu Minato
Archive | 1999
Youichi Ishimura; Hideki Takahashi; Norihisa Asano
Archive | 1995
Yoshifumi Tomomatsu; Youichi Ishimura
Archive | 2002
Youichi Ishimura; Yoshifumi Tomomatsu
Archive | 2002
Youichi Ishimura; Yoshifumi Tomomatsu
Archive | 1995
Youichi Ishimura; Yoshifumi Fukuoka-shi Tomomatsu
Archive | 1999
Youichi Ishimura; Hiroshi Yamaguchi; Kazunari Hatade