Yukinori Kuwano

Development of New a-Si/c-Si Heterojunction Solar Cells: ACJ-HIT (Artificially Constructed Junction-Heterojunction with Intrinsic Thin-Layer)

A new type of a-Si/c-Si heterojunction solar cell, called the HIT (Heterojunction with Intrinsic Thin-layer) solar cell, has been developed based on ACJ (Artificially Constructed Junction) technology. A conversion efficiency of more than 18% has been achieved, which is the highest ever value for solar cells in which the junction was fabricated at a low temperature (<200°C).

Interference-Free Determination of the Optical Absorption Coefficient and the Optical Gap of Amorphous Silicon Thin Films

A new method to determine the optical absorption coefficient (α) of thin films is presented. α of hydrogenated amorphous silicon (a-Si:H) based alloys can be accurately determined from transmittance (T) and reflectance (R) by using T/(1-R), which almost completely eliminates disturbance from the optical interference effect. The method is applicable to any thin films, as long as the film is a single layer. Based on the interference-free α, various methods to determine the optical gap (EOPT) of a-Si:H, a-SiC:H, and a-SiGe:H films are discussed. The (nαhν)1/3 plot and the (αhν)1/3 plot are most suitable for characterizing these films. The well-known (αhν)1/2 plot is less suited for detailed discussion of the EOPT than the cube root plot, because the plot includes a large ambiguity in the EOPT. The effect of the optical interference effect on the determination of the EOPT is also discussed.

Enlargement of Poly-Si Film Grain Size by Excimer Laser Annealing and Its Application to High-Performance Poly-Si Thin Film Transistor

By both numerical simulation and experimental investigation, we found it possible to enlarge the grain size (?3000 ?) of polycrystalline silicon (poly-Si) films by excimer laser annealing, using a new method to control the solidification process of molten Si - low-temperature (?400?C) substrate heating during laser annealing. Poly-Si thin-film transistors (TFTs) fabricated by this new excimer laser annealing method showed a high field-effect mobility of 230 cm2/V?s, and good uniformity of field-effect mobility (?10%) within the effective laser irradiation area.

The Influence of the Si-H2 Bond on the Light-Induced Effect in a-Si Films and a-Si Solar Cells

The influence of the Si-H2 bond on light-induced degradation and the thermal recovery of a-Si films and a-Si solar cells were studied. The influence of the Si-H2 bond on light-induced degradation depends on the impurity content in a-Si films, and light-induced degradation can be reduced by decreasing the Si-H2 bond density in a-Si films with impurity content of 1018 cm-3. The activation energy of the thermal recovery process was about 1.0 eV, and it did not depend on the Si-H2 bond density. However, an irreversible phenomenon was observed in film properties and solar cell characteristics with high Si-H2 bond density. It is thought that the structural flexibility of the Si-H2 bond is related to this irreversible phenomenon.

Improvement of n-Type Poly-Si Film Properties by Solid Phase Crystallization Method

Polycrystalline silicon (poly-Si) thin films prepared by the solid phase crystallization (SPC) method were investigated for application as photovoltaic materials. To improve the properties of the poly-Si thin film, two methods were developed to control crystallization. One is the partial doping method, in which starting material of a-Si consists of a doped layer and an undoped layer. We have succeeded in controlling nuclei generation using partial doping, and high mobility of 196 cm2/Vs was obtained at a carrier concentration of 1×1018 cm-3. SPC temperature can also be decreased to 500°C. The other is adoption, for the first time, of a textured substrate which exerted effects on the enlargement of grain size in poly-Si thin films prepared by the SPC method. By combining the partial doping method with the textured substrate, an n-type poly-Si thin-film with the grain size of 6 µm was fabricated which showed the Hall mobility of 623 cm2/Vs (n: 3.0\times1015 cm-3). In a solar cell (thickness: 12 µm) applying this film, a conversion efficiency of 6.2% was obtained and a collection efficiency of 50% was achieved at a wavelength of 900 nm.

Principles for controlling the optical and electrical properties of hydrogenated amorphous silicon deposited from a silane plasma

The optical, electrical, and structural properties of hydrogenated amorphous silicon (a‐Si:H) films are systematically investigated as functions of the substrate temperature (Ts) and plasma parameters, such as the rf power, gas pressure, and electrode dimensions. The films are deposited by the plasma chemical vapor deposition method. The properties of a‐Si:H can be controlled over a wide range by varying the plasma parameters at fixed Ts. Reducing the film deposition rate and raising Ts have the same effect on the properties of a‐Si:H. A unified relationship is found to exist among those properties of a‐Si:H in the range of deposition conditions in this study, which includes ‘‘device‐quality’’ conditions. No apparent effects of gas‐phase polymerization or ion bombardment are observed. The experimental results suggest that during device‐quality a‐Si:H film deposition under conventional plasma conditions, the film properties are governed by a competition between the rate of film growth and the rate of therm...

Preparation of high-quality n-type poly-Si films by the solid phase crystallization (SPC) method

For further improvement of conversion efficiency in a-Si solar cells, it is necessary to develop materials with high photosensitivity in the long-wavelength region. A new solid phase crystallization (SPC) method was developed to grow a Si crystal at temperatures as low as 600°C. Using this method, high-quality thin-film polycrystalline silicon (poly-Si) with a Hall mobility of 70 cm2/Vs was obtained. Quantum efficiency in the range of 800 nm ~ 1000 nm was achieved up to 80% in an experimental solar cell using the n-type poly-Si with a grain size of about 1.5 µm. Therefore, it was found that our SPC method was suitable as a new technique to prepare high-quality solar cell materials.

Preparation and Properties of High-Quality a-Si Films with a Super Chamber (Separated Ultra-High Vacuum Reaction Chamber)

A separated ultra-high vacuum (UHV) reaction chamber system, called the super chamber, has been newly developed. A background pressure of 10-9 Torr was obtained, and the impurity concentrations of oxygen, nitrogen and carbon in an a-Si film fabricated in the super chamber were 2×1018 cm-3, 1×1017 cm-3, and 2×1018 cm-3, respectively. The space charge density and the ESR spin density of the a-Si film were 5×1014 cm-3 and 2×1015 cm-3, respectively. These values were much lower than those for films fabricated in a conventional chamber. The ratio of the light-induced degradation in the photoconductivity of the a-Si film was also small compared with that of conventional a-Si films. A conversion efficiency of 11.7% was obtained for a glass/textured TCO/pin/Ag a-Si solar cell, whose i-layer was fabricated in the super chamber.

Laser Patterning Method for Integrated Type a-Si Solar Cell Submodules

A laser patterning method was investigated as a fabrication method for integrated-type amorphous-silicon (a-Si) solar cell submodules. A three-dimensional thermal analysis of a multilayer structure was performed to determine the selective scribing conditions for each layer of an a-Si solar cell. The optimum laser power densities calculated from a three-dimensional thermal analysis were confirmed by the experiments. It was found that not only transparent conductive oxide and a-Si films, but also the metal electrodes of the integrated-type a-Si solar cell submodule were selectively scribed. The total output power of an a-Si solar cell submodule patterned by optimum laser-power densities was 9% higher than that achieved by a conventional patterning method.

Improving the uniformity of poly-Si films using a new excimer laser annealing method for giant-microelectronics

Film uniformity is the main problem when applying laser-recrystallised poly-Si films to thin film transistors (TFTs) in giant micro electronics. However, this has been dramatically improved by a new excimer laser annealing method in which the solidification process of molten Si is controlled by low-temperature (400°C) substrate heating during excimer laser annealing. Poly-Si TFT fabricated around the laser irradiation overlap region exhibited a high field effect mobility uniformity of within ±8%.