Takao Matsuyama

Development of New a-Si/c-Si Heterojunction Solar Cells: ACJ-HIT (Artificially Constructed Junction-Heterojunction with Intrinsic Thin-Layer)

A new type of a-Si/c-Si heterojunction solar cell, called the HIT (Heterojunction with Intrinsic Thin-layer) solar cell, has been developed based on ACJ (Artificially Constructed Junction) technology. A conversion efficiency of more than 18% has been achieved, which is the highest ever value for solar cells in which the junction was fabricated at a low temperature (<200°C).

High-quality polycrystalline silicon thin film prepared by a solid phase crystallization method

Abstract We succeeded in fabricating high-quality polycrystalline silicon (poly-Si) thin films with no boundary from the bottom surface to the top, and achieved an extremely high electron mobility of 808 cm2/V s by a solid phase crystallization (SPC) method. This film was obtained by using a new nucleation layer with 1000 A wide single-crystalline grains embedded in a matrix of amorphous tissue. A poly-Si thin-film solar cell fabricated using this film as an active layer demonstrated a total area conversion efficiency of 9.2% (active area efficiency: 9.7%), which is the worlds highest value for crystalline silicon solar cells fabricated below 600°C on metal substrates.

Improvement of n-Type Poly-Si Film Properties by Solid Phase Crystallization Method

Polycrystalline silicon (poly-Si) thin films prepared by the solid phase crystallization (SPC) method were investigated for application as photovoltaic materials. To improve the properties of the poly-Si thin film, two methods were developed to control crystallization. One is the partial doping method, in which starting material of a-Si consists of a doped layer and an undoped layer. We have succeeded in controlling nuclei generation using partial doping, and high mobility of 196 cm2/Vs was obtained at a carrier concentration of 1×1018 cm-3. SPC temperature can also be decreased to 500°C. The other is adoption, for the first time, of a textured substrate which exerted effects on the enlargement of grain size in poly-Si thin films prepared by the SPC method. By combining the partial doping method with the textured substrate, an n-type poly-Si thin-film with the grain size of 6 µm was fabricated which showed the Hall mobility of 623 cm2/Vs (n: 3.0\times1015 cm-3). In a solar cell (thickness: 12 µm) applying this film, a conversion efficiency of 6.2% was obtained and a collection efficiency of 50% was achieved at a wavelength of 900 nm.

Preparation of high-quality n-type poly-Si films by the solid phase crystallization (SPC) method

For further improvement of conversion efficiency in a-Si solar cells, it is necessary to develop materials with high photosensitivity in the long-wavelength region. A new solid phase crystallization (SPC) method was developed to grow a Si crystal at temperatures as low as 600°C. Using this method, high-quality thin-film polycrystalline silicon (poly-Si) with a Hall mobility of 70 cm2/Vs was obtained. Quantum efficiency in the range of 800 nm ~ 1000 nm was achieved up to 80% in an experimental solar cell using the n-type poly-Si with a grain size of about 1.5 µm. Therefore, it was found that our SPC method was suitable as a new technique to prepare high-quality solar cell materials.

Polycrystalline Si thin-film solar cell prepared by solid phase crystallization (SPC) method

Abstract The solid phase crystallization (SPC) method has been studied for fabricating polycrystalline (poly) Si thin films for solar cells. The approach was to optimize the “partial doping structure” (nondoped a-Si/phosphorus(P)-doped a-Si) which we proposed as a starting structure before SPC. A conversion efficiency of 6.3% was obtained by using nondoped a-Si with a large structural disorder. This cell showed a collection efficiency of 51% at a wavelength of 900 nm. In order to significantly reduce the incubation time which is the important factor for the enlargement of the grain size, P doping of more than 1020 cm−3 was required for the P-doped layer.

Superlattice structure a-Si films fabricated by the photo-CVD method and their application to solar cells

Amorphous silicon superlattice structure films were fabricated by the photo-CVD method for the first time; also, the structural, optical and electrical properties of the films were investigated. A comparison of the photoluminescence intensities indicated that low damage to the interface was accomplished by using the photo-CVD method. A new type of solar cell was also developed using a superlattice structure as the p-layer of an a-Si solar cell. A conversion efficiency of 10.5% was obtained for a glass/TCO/p-superlattice structure/in/Metal a-Si solar cell.

More than 16% solar cells with a new 'HIT' (doped a-Si/nondoped a-Si/crystalline Si) structure

A HIT (heterojunction with intrinsic thin-layer) structure solar cell has been developed. In this structure, a nondoped a-Si thin layer was inserted between a p-type a-Si layer and an n-layer c-Si substrate. The open-circuit voltage and fill factor (FF) were significantly improved in these HIT structure solar cells compared with conventional p/n heterojunction solar cells. The improvement seems to originate in the reduction of backward current density. For higher efficiency, this HIT structure has been applied to textured substrates and achieved an efficiency of 18.1% (1 cm/sup 2/ cell). This efficiency is the highest value reported for a solar cell in which the junction was fabricated at a low temperature (120 degrees C). Application of this structure to the poly-Si thin film will yield a-Si/poly-Si thin-film solar cells of high efficiency.<<ETX>>

High-Quality p-Type a-SiC Films Obtained by Using a New Doping Gas of B(CH3)3

High-quality p-type a SiC films can be fabricated by using a new type of doping gas, B(CH3)3, instead of B2H6 in a photo-CVD method and a glow discharge method. The photoconductivity and doping efficiency of a-SiC films fabricated by the photo-CVD method are improved by using B(CH3)3. A reduction of tail state density and an increase in photoluminescence are also observed. Furthermore, a bandgap narrowing in highly B-doped a-SiC films fabricated by the glow discharge method can be prevented by using B(CH3)3. A conversion efficiency of 10.0% (total area efficiency of 9.02%) is obtained for a 100 cm2 integrated-type a-Si solar cell whose p-layer was fabricated by the glow discharge method with B(CH3)3.

A More Than 18% Efficiency Hit Structure a-Si/c-Si Solar Cell Using Artificially Constructed Junction (ACJ)

We have obtained the worlds highest total area conversion efficiency of 11.1% for a 100cm 2 integrated-type single-junction a-Si solar cell submodule. This was achieved by the development of various advanced technologies, such as a new ultra-thin i/n interface layer and a new laser patterning method using an ablation phenomenon. To acheive further improvement in the conversion efficiency of a-Si based solar cells, we focus on polycrystalline silicon (poly-Si) thin-film for a-Si/poly-Si tandem solar cells. As far as material technology is concerned, we have used a new solid phase crystallization (SPC) method from amorphous silicon (a-Si) films deposited by plasma-CVD. The maximum mobility of 623 cm 2 /V.s was achieved on textured substrates at a carrier concentration of 3.0 × 10 15 cm -3 . This film has been applied to the active layer of poly-Si solar cells on metal substrates and a conversion efficiency of 6.2% has been obtained with poly-Si film of 12 μm thickness made by SPC at 600°C. In the field of device technology, we have developed new artificially constructed junction (ACJ) solar cells using p-type a-Si/i-type a-Si/n-type crystalline silicon (c-Si). We call this a HIT (Heterojunction with Intrinsic Ihin-layer) structure, and we have achieved a conversion efficiency of 18.1% for this type of solar cells. This is the highest reported value for a cell with a junction fabricated at low temperature (∼ 120°C).

High-Quality Polycrystalline Silicon Thin Film Prepared by a Solid Phase Crystallization Method

We succeeded, for the first time, in depositing a silicon film which features 1000A-wide single-crystalline grains embedded in a matrix of amorphous tissue. The deposition was done by plasma-enhanced CVD from silane diluted with hydrogen at a considerably high temperature (550°C). 5pm-thick undoped amorphous silicon film was deposited on the above film and was crystallized by a solid phase crystallization method. The polycrystalline silicon film which was obtained has a columnar structure and shows an extremely high electron mobility of 808 cm 2 /Vs.