Zishu Zhang
Micron Technology
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Publication
Featured researches published by Zishu Zhang.
Proceedings of SPIE | 2011
Zishu Zhang; Kaveri Jain; Scott L. Light; Anton deVilliers
Three resist freezing methods (fluoride plasma, chemical and thermal freezing) were studied for double patterning cross pattern by printing the second layer directly on top of the first resist layer. Different methods show different challenges: plasma freezing is very hard to remove footing on both layers; Chemical freezing first layer CD will grow after completion of second pattern; thermal freezing will change line curvature when the CD is smaller than 50nm, if first layer is wave type pattern.
Archive | 2013
Dan B. Millward; Kaveri Jain; Zishu Zhang; Lijing Gou; Anton J. DeVillers; Jianming Zhou; Yuan He; Michael Hyatt; Scott L. Light
Archive | 2011
Dan B. Millward; Yuan He; Lijing Gou; Zishu Zhang; Anton deVilliers; Jianming Zhou; Kaveri Jain; Scott L. Light; Michael Hyatt
Archive | 2011
Yuan He; Kaveri Jain; Lijing Gou; Zishu Zhang; Anton deVilliers; Michael Hyatt; Jianming Zhou; Scott L. Light; Dan B. Millward
Archive | 2012
Zishu Zhang; Anton deVilliers; Robert Carr; Farrell Good
Archive | 2008
Zishu Zhang; Hongbin Zhu; Anton deVilliers; Alex J. Schrinsky
Archive | 2013
Scott L. Light; Dan B. Millward; Anton deVilliers; Yuan He; Michael Hyatt; Lijing Gou; Kaveri Jain; Zishu Zhang; Jianming Zhou
Archive | 2011
Yuan He; Jianming Zhou; Scott L. Light; Anton deVilliers; Kaveri Jain; Zishu Zhang; Dan B. Millward
Archive | 2011
Jianming Zhou; Scott L. Light; Dan B. Millward; Yuan He; Kaveri Jain; Lijing Gou; Zishu Zhang; Anton deVilliers; Michael Hyatt
Archive | 2011
Anton deVilliers; Jianming Zhou; Kaveri Jain; Dan B. Millward; Scott L. Light; Zishu Zhang; Lijing Gou; Yuan He; Michael Hyatt
