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Lijing Gou

Micron Technology

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Publication

Featured researches published by Lijing Gou.

Proceedings of SPIE | 2011

Reduction of micro-bridging defects for 193nm immersion resist

Lijing Gou; Vinay Nair; Hiroyuki Mori; Adam L. Olson; David Swindler; Anton deVilliers

Factors such as post-develop hydrophobicity, polymer aggregation and acid diffusion length are driving forces in the formation of micro bridging defects. In this report, solutions for each possible cause are proposed and tested. It is proven that micro-bridging levels can be significantly reduced through a multi-tiered approach.

Archive | 2013

Semiconductor constructions and methods of forming patterns

Dan B. Millward; Kaveri Jain; Zishu Zhang; Lijing Gou; Anton J. DeVillers; Jianming Zhou; Yuan He; Michael Hyatt; Scott L. Light

Archive | 2012

Methods of forming features in semiconductor device structures

Adam L. Olson; Kaveri Jain; Lijing Gou; William R. Brown; Ho Seop Eom; Xue Chen; Anton deVilliers

Archive | 2012

METHODS FOR FORMING RESIST FEATURES, PATTERNS IN A RESIST, AND ARRAYS OF ALIGNED, ELONGATE RESIST FEATURES

Kaveri Jain; Adam L. Olson; William R. Brown; Lijing Gou; Ho Seop Eom; Anton deVilliers

Archive | 2011

METHODS OF FORMING A PATTERNED, SILICON-ENRICHED DEVELOPABLE ANTIREFLECTIVE MATERIAL AND SEMICONDUCTOR DEVICE STRUCTURES INCLUDING THE SAME

Dan B. Millward; Yuan He; Lijing Gou; Zishu Zhang; Anton deVilliers; Jianming Zhou; Kaveri Jain; Scott L. Light; Michael Hyatt

Archive | 2011

Imaging devices, methods of forming same, and methods of forming semiconductor device structures

Yuan He; Kaveri Jain; Lijing Gou; Zishu Zhang; Anton deVilliers; Michael Hyatt; Jianming Zhou; Scott L. Light; Dan B. Millward

Archive | 2013

RETICLE WITH COMPOSITE POLARIZER AND METHOD OF SIMULTANEOUS OPTIMIZATION OF IMAGING OF A SET OF DIFFERENT PATTERNS

Scott L. Light; Dan B. Millward; Anton deVilliers; Yuan He; Michael Hyatt; Lijing Gou; Kaveri Jain; Zishu Zhang; Jianming Zhou

Archive | 2012

Methods for forming resist features and arrays of aligned, elongate resist features

Kaveri Jain; Adam L. Olson; William R. Brown; Lijing Gou; Ho Seop Eom; Anton deVilliers

Archive | 2008

METHOD OF REDUCING PHOTORESIST DEFECTS DURING FABRICATION OF A SEMICONDUCTOR DEVICE

Yoshiki Hishiro; Lijing Gou; Scott E. Sills; Hiroyuki Mori; Paul D. Shirley; Troy V. Gugel; Adam L. Olson

Archive | 2007

Methods of Lithographically Patterning a Substrate

Yoshiki Hishiro; Scott E. Sills; Hiroyuki Mori; Troy V. Gugel; Paul D. Shirley; Lijing Gou; Adam L. Olson

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Anton deVilliers

Micron Technology

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Kaveri Jain

Micron Technology

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Dan B. Millward

Micron Technology

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Jianming Zhou

Micron Technology

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Michael Hyatt

Micron Technology

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Scott L. Light

Micron Technology

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Yuan He

Micron Technology

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Zishu Zhang

Micron Technology

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Adam L. Olson

Micron Technology

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Ho Seop Eom

Micron Technology

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