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Featured researches published by Akihiro Tomozawa.


Japanese Journal of Applied Physics | 2002

Observation of ultrasonic wavefronts by synchronous Schlieren imaging

Takashi Azuma; Akihiro Tomozawa; Shin-ichiro Umemura

A synchronous Schlieren system for observation of ultrasound wavefronts was developed. Since high-intensity and short-response-time GaN/InGaN green light-emitting diodes (LEDs) are suitable light sources of a Schlieren system, we constructed such a system by pulsed illumination synchronized to ultrasound. We used it to observed progressive plane waves and their transmission through a thin plate. Moreover, we used it to observe Lamb waves in the plate by imaging the ultrasonic field in the fluid in its vicinity. The results obtained showed the effectiveness of this system. It has also been proven to be useful for overviewing the spatial distribution of the phase factor of an ultrasonic field, which may be similar to that of ultrasonic power.


Archive | 1986

Process of fabricating a semiconductor insulated circuit device having a phosphosilicate glass insulating film

Akihiro Tomozawa; Yoku Kaino; Shigeru Shimada; Nozomi Horino; Yoshiaki Yoshiura; Osamu Tsuchiya; Shozo Hosoda


Archive | 1974

Method of forming insulating film on interconnection layer

Akihiro Tomozawa; Kensuke Nakata; Akira Kikuchi; Takashi Agastuma


Archive | 1974

Method of manufacturing interconnection substrate

Akihiro Tomozawa; Kensuke Nakata; Akira Kikuchi; Takashi Agatsuma


Archive | 1973

Method of producing multi-layer structure

Norio Anzai; Akihiro Tomozawa; Masayasu Tsunematsu; Yasushi Matsui


Archive | 1976

Method of producing MIS structure

Akira Nagase; Masayasu Tsunematsu; Norio Anzai; Akihiro Tomozawa


Archive | 1975

Method of making integrated circuits free from the formation of a parasitic PNPN thyristor

Akihiro Tomozawa; Takanori Nishimura; Takashi Yamaguchi


Archive | 1984

Process of fabricating semiconductor integrated circuit device

Akihiro Tomozawa; Yoku Kaino; Shigeru Shimada; Nozomi Horino; Yoshiaki Yoshiura; Osamu Tsuchiya; Shozo Hosoda


Solid State Phenomena | 2001

Megasonic Silicon Wafer Cleaning and Its Influence on LSI Devices

Akihiro Tomozawa; Akihiro Ohnishi; Hideo Kinoshita; Takashi Nakano


Solid State Phenomena | 2001

Application of Megasonic Single Wafer Cleaning Technology to LSI Mass Production Line

Yutaka Shimada; Hiroshi Itou; Y. Ishii; Tatsumi Shirasu; Akihiro Tomozawa

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