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Featured researches published by Takashi Agatsuma.


IEEE Transactions on Electron Devices | 1978

An analysis of equivalent circuit with gate protection in MOS devices

Takashi Agatsuma; S. Ishii

The dependence of the resistance associated with the equivalent circuit with gate protection on the electrical breakdown voltage was analyzed in terms of the transient solution of the equivalent circuit. The series resistance for the input voltage and the dynamic resistance in the breakdown region of the protective diode are found to have pronounced effects on the electrical breakdown voltage of the gate oxide, while the distributed resistance has a lesser effect on it.


IEEE Transactions on Electron Devices | 1966

A characterization technique for second breakdown in Ge alloyed junction transistors

Takashi Agatsuma

A characterization technique for second breakdown in Ge p-n-p alloyed junction transistors with the open base condition is described. This method is based on the saturated characteristics which are expressed in the form of exponential dependence on the slope of the rising part of the applied voltage. Using this method, a comparison is made of transistor SB characteristics in terms of device characteristics, such as BV CEO and H FE .


Archive | 1979

IIL With in and outdiffused emitter pocket

Tomoyuki Watanabe; Takahiro Okabe; Minoru Nagata; Tohru Nakamura; Kenji Kaneko; Yutaka Okada; Norio Anzai; Takanori Nishimura; Takashi Agatsuma


Archive | 1974

Method of manufacturing interconnection substrate

Akihiro Tomozawa; Kensuke Nakata; Akira Kikuchi; Takashi Agatsuma


Archive | 1973

Method of forming interconnections

Akira Kikuchi; Takashi Agatsuma; A Anzai


Archive | 1984

Method for manufacturing semiconductor device having isolating groove

Takashi Agatsuma


Archive | 1973

Verfahren zur herstellung von substraten mit verbundenen leiterschichten

Akihiro Tomozawa; Kensuke Nakata; Akira Kikuchi; Takashi Agatsuma; Tokio Kodaira


IEEE Transactions on Electron Devices | 1975

Use of drain capacitance—Voltage characteristics as a process control tool for the threshold voltage of Silicon gate MOSFET's

Takashi Agatsuma; J. Morita


Archive | 1974

Verfahren zur herstellung von isolierfilmen auf verbindungsschichten Process for the preparation of insulating films on interconnect layers

Akihiro Tomozawa; Kensuke Nakata; Akira Kikuchi; Takashi Agatsuma; Tokio Kodaira


Archive | 1974

Verfahren zur herstellung von isolierfilmen auf verbindungsschichten

Akihiro Tomozawa; Kensuke Nakata; Akira Kikuchi; Takashi Agatsuma; Tokio Kodaira

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