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Akira Iio

Toshiba

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Publication

Featured researches published by Akira Iio.

Archive | 2000

Chemical mechanical method of polishing wafer surfaces

Hiroyuki Yano; Gaku Minamihaba; Yukiteru Matsui; Nobuo Hayasaka; Katsuya Okumura; Akira Iio; Masayuki Hattori; Masayuki Motonari

Archive | 2000

Composite particles and production process thereof, aqueous dispersion, aqueous dispersion composition for chemical mechanical polishing, and process for manufacture of semiconductor device

Hiroyuki Yano; Gaku Minamihaba; Yukiteru Matsui; Katsuya Okumura; Masayuki Motonari; Masayuki Hattori; Akira Iio

Archive | 2000

Aqueous dispersion, aqueous dispersion for chemical mechanical polishing used for manufacture of semiconductor devices, method for manufacture of semiconductor devices, and method for formation of embedded writing

Hiroyuki Yano; Gaku Minamihaba; Yukiteru Matsui; Katsuya Okumura; Akira Iio; Masayuki Hattori

Archive | 2001

Polymer particles and polishing material containing them

Masayuki Hattori; Masayuki Motonari; Akira Iio

Archive | 1999

Aqueous dispersion for mechanochemical polishing

Masayuki Hattori; Akira Iio; Kiyonobu Kubota; Masayuki Motonari; 正之 元成; 雅幸 服部; 清信 窪田; 章 飯尾

Archive | 1999

Water-based dispersion for mechaniochemical polishing of copper

Masayuki Hattori; Akira Iio; Fukugaku Minami; Masayuki Motonari; Katsuya Okumura; Hiroyuki Yano; 正之 元成; 学 南幅; 勝弥 奥村; 雅幸 服部; 博之 矢野; 章 飯尾

Archive | 2000

Water-laden solid matter of vapor-phase processed inorganic oxide particles and slurry for polishing and manufacturing method of semiconductor devices

Hiroyuki Yano; Nobuo Hayasaka; Katsuya Okumura; Akira Iio; Masayuki Hattori; Kiyonobu Kubota

Archive | 1997

Regenerating method of filter

Masayuki Hattori; Akira Iio; Masayuki Motonari; 正之 元成; 雅幸 服部; 章 飯尾

Archive | 2006

Aqueous dispersion for chemical mechanical polishing used in manufacture of semiconductor device, and manufacturing method of semiconductor device

Masayuki Hattori; Akira Iio; Yukiteru Matsui; Fukugaku Minami; Masayuki Motonari; Katsuya Okumura; Hiroyuki Yano; 正之 元成; 学 南幅; 勝弥 奥村; 雅幸 服部; 之輝 松井; 博之 矢野; 章 飯尾

Archive | 2000

Kompositteilchen und Verfahren zu Ihrer Herstellung, wässrige Dispersion zum chemisch-mechanischen Polieren und Verfahren zur Herstellung von Halbleiteranordnungen

Hiroyuki Yano; Gaku Minamihaba; Yukiteru Matsui; Katsuya Okumura; Masayuki Motonari; Masayuki Hattori; Akira Iio

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Masayuki Hattori

Toshiba

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Hiroyuki Yano

Ebara Corporation

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Masayuki Motonari

Toshiba

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Katsuya Okumura

University of Tokyo

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Yukiteru Matsui

Toshiba

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Gaku Minamihaba

Toshiba

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Kiyonobu Kubota

Toshiba

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Nobuo Hayasaka

Toshiba

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Katsuya Okumura

University of Tokyo

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