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Alexander Matyushkin

Applied Materials

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Publication

Featured researches published by Alexander Matyushkin.

Archive | 2007

Substrate support with electrostatic chuck having dual temperature zones

Alexander Matyushkin; Dennis Koosau; Theodoros Panagopoulos; John Holland

Archive | 2007

Substrate processing with rapid temperature gradient control

Alexander Matyushkin; Dan Katz; John Holland; Theodoros Panagopoulos; Michael D. Willwerth

Archive | 2006

Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency

Alexander Paterson; Valentin N. Todorow; Theodoros Panagopoulos; Brian K. Hatcher; Dan Katz; Edward P. Hammond; John Holland; Alexander Matyushkin

Archive | 2012

Electrostatic chuck having a plurality of heater coils

Alexander Matyushkin; Dennis Koosau; Theodoros Panagopoulos; John Holland

Archive | 2006

Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution

Alexander Paterson; Valentin N. Todorow; Theodoros Panagopoulos; Brian K. Hatcher; Dan Katz; Edward P. Hammond; John Holland; Alexander Matyushkin

Archive | 2006

Plasma reactor apparatus with independent capacitive and toroidal plasma sources

Alexander Paterson; Valentin N. Todorow; Theodoros Panagopoulos; Brian K. Hatcher; Dan Katz; Edward P. Hammond; John Holland; Alexander Matyushkin

Archive | 2009

Etch reactor suitable for etching high aspect ratio features

Manfred Oswald; Jivko Dinev; Jan Rupf; Markus Meye; Francesco Maletta; Uwe Leucke; Ron Tilger; Farid Abooameri; Alexander Matyushkin; Denis M. Koosau; Xiaoping Zhou; Thorsten Lehmann; Declan Scanlan

Archive | 2006

Plasma reactor apparatus with independent capacitive and inductive plasma sources

Alexander Paterson; Valentin N. Todorow; Theodoros Panagopoulos; Brian K. Hatcher; Dan Katz; Edward P. Hammond; John Holland; Alexander Matyushkin

Archive | 2008

HIGH TEMPERATURE CATHODE FOR PLASMA ETCHING

Boris Yendler; Alexander Matyushkin; Denis M. Koosau; Glen Egami

Archive | 2006

Plasma reactor apparatus with a toroidal plasma source and a VHF capacitively coupled plasma source with variable frequency

Alexander Paterson; Valentin N. Todorow; Theodoros Panagopoulos; Brian K. Hatcher; Dan Katz; Edward P. Hammond; John Holland; Alexander Matyushkin

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John Holland

Applied Materials

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Theodoros Panagopoulos

Applied Materials

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Dan Katz

Applied Materials

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Alexander Paterson

Applied Materials

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Brian K. Hatcher

Applied Materials

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Edward P. Hammond

Applied Materials

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Valentin N. Todorow

Applied Materials

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Denis M. Koosau

Applied Materials

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Boris Yendler

Applied Materials

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Declan Scanlan

Applied Materials

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