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Brian K. Hatcher

Applied Materials

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Publication

Featured researches published by Brian K. Hatcher.

Archive | 1997

Treatment of etching chambers using activated cleaning gas

Gerald Zheyao Yin; Xue-Yu Qian; Patrick Leahey; Jonathan D. Mohn; Waiching Chow; Arthur Y. Chen; Zhiwen Sun; Brian K. Hatcher

Archive | 1997

Closed-loop dome thermal control apparatus for a semiconductor wafer processing system

Patrick Leahey; Jerry C. Chen; Richard E. Remington; Simon Yavelberg; Timothy D. Driscoll; Robert E. Ryan; Brian K. Hatcher; Rolf A. Guenther; Xueyu Qian

Archive | 2008

Plasma process employing multiple zone gas distribution for improved uniformity of critical dimension bias

Dan Katz; David Palagashvili; Brian K. Hatcher; Theodoros Panagopoulos; Valentin N. Todorow; Edward P. Hammond; Alexander Paterson; Rodolfo P. Belen

Archive | 2007

Mid-chamber gas distribution plate, tuned plasma flow control grid and electrode

Alexander Paterson; John Holland; Theodoros Panagopoulos; Edward P. Hammond; Brian K. Hatcher; Valentin N. Todorow; Dan Katz

Archive | 2005

Alternating asymmetrical plasma generation in a process chamber

Alexander Paterson; Elizabeth G. Pavel; Valentin N. Todorow; Huong Thanh Nguyen; Thomas J. Kropewnicki; Brian K. Hatcher; John Holland

Archive | 2006

Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency

Alexander Paterson; Valentin N. Todorow; Theodoros Panagopoulos; Brian K. Hatcher; Dan Katz; Edward P. Hammond; John Holland; Alexander Matyushkin

Archive | 2006

Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution

Alexander Paterson; Valentin N. Todorow; Theodoros Panagopoulos; Brian K. Hatcher; Dan Katz; Edward P. Hammond; John Holland; Alexander Matyushkin

Archive | 2009

Plasma reactor electrostatic chuck having a coaxial rf feed and multizone ac heater power transmission through the coaxial feed

Michael D. Willwerth; David Palagashvili; Brian K. Hatcher; Alexander Paterson; Douglas A. Buchberger

Archive | 2006

Plasma reactor apparatus with independent capacitive and toroidal plasma sources

Alexander Paterson; Valentin N. Todorow; Theodoros Panagopoulos; Brian K. Hatcher; Dan Katz; Edward P. Hammond; John Holland; Alexander Matyushkin

Archive | 2006

Plasma reactor apparatus with independent capacitive and inductive plasma sources

Alexander Paterson; Valentin N. Todorow; Theodoros Panagopoulos; Brian K. Hatcher; Dan Katz; Edward P. Hammond; John Holland; Alexander Matyushkin

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Collaboration

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Alexander Paterson

Applied Materials

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Dan Katz

Applied Materials

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Edward P. Hammond

Applied Materials

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Valentin N. Todorow

Applied Materials

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John Holland

Applied Materials

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Theodoros Panagopoulos

Applied Materials

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Alexander Matyushkin

Applied Materials

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Rodolfo P. Belen

Applied Materials

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Patrick Leahey

Applied Materials

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Valentin N. Todorov

Applied Materials

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