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Allen Fox

Applied Materials

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Publication

Featured researches published by Allen Fox.

Archive | 2005

Electrostatic chuck having textured contact surface

Jennifer Y. Sun; James Dempster; Semyon L. Kats; Allen Fox

Archive | 2007

Methods and apparatus for pfc abatement using a cdo chamber

Sebastien Raoux; Kuo-Chen Lin; Robbert M. Vermeulen; Daniel O. Clark; Stephen Tsu; Mehran Moalem; Allen Fox; Monique Mcintosh; Joshua Putz; Eric Rieske; Poh Soh Lee

Archive | 2007

Methods and apparatus for improving operation of an electronic device manufacturing system

Sebastien Raoux; Mark W. Curry; Peter I. Porshnev; Allen Fox

Archive | 2009

ABATEMENT SYSTEM HAVING ENHANCED EFFLUENT SCRUB AND MOISTURE CONTROL

Phil Chandler; Daniel O. Clark; Frank F. Hooshdaran; Daniel S. Brown; Barry Page; Allen Fox; George L. Dansen; Jay Jung

Archive | 2008

APPARATUS AND METHODS FOR REDUCING RESTRICTIONS TO AIR FLOW IN AN ABATEMENT SYSTEM

Mark W. Curry; Shaun W. Crawford; Barry Page; Robbert M. Vermeulen; Allen Fox; Daniel S. Brown; Rene T. Correa; Youssef A. Loldj; William D. Pyzel; Daniel O. Clark

Archive | 2008

APPARATUS AND METHODS FOR AMBIENT AIR ABATEMENT OF ELECTRONIC DEVICE MANUFACTURING EFFLUENT

Mark W. Curry; Barry Page; Shaun W. Crawford; Robbert M. Vermeulen; William D. Pyzel; Youssef A. Loldj; Rene T. Correa; Daniel S. Brown; Allen Fox

Archive | 2009

Apparatus and methods for supplying fuel employed by abatement systems to effectively abate effluents

Daniel O. Clark; Allen Fox; Robbert M. Vermeulen; Shaun W. Crawford

Archive | 2009

METHODS AND APPARATUS FOR ABATING ELECTRONIC DEVICE MANUFACTURING PROCESS EFFLUENT

Allen Fox; Daniel O. Clark; Frank F. Hooshdaran; Belynda Flippo

Archive | 2009

Procédés et appareil pour réduire l'effluent de procédé de fabrication de dispositif électronique

Allen Fox; Daniel O. Clark; Frank F. Hooshdaran; Belynda Flippo

Archive | 2007

Procédés et appareil permettant de supprimer les pfc au moyen d'une chambre d'oxydation par décomposition contrôlée

Daniel O. Clark; Allen Fox; Poh Soh Lee; Kuo-Chen Lin; Monique Mcintosh; Mehran Moalem; Joshua Putz; Sebastien Raoux; Eric Rieske; Stephen Tsu; Robert M. Vermeulen

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Collaboration

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Daniel O. Clark

Dow Chemical Company

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Mark W. Curry

Applied Materials

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Robbert M. Vermeulen

Applied Materials

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Sebastien Raoux

Applied Materials

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Barry Page

Applied Materials

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Daniel S. Brown

Applied Materials

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Frank F. Hooshdaran

Applied Materials

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Shaun W. Crawford

Applied Materials

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Belynda Flippo

Applied Materials

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Eric Rieske

Applied Materials

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