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Andreas Frommeyer

Carl Zeiss AG

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Featured researches published by Andreas Frommeyer.

Archive | 2009

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD

Mariella Beckenbach; Klaus Rief; Andreas Bertele; Benjamin Sigel; Sascha Bleidistel; Wolfgang Hummel; Andreas Frommeyer; Toralf Gruner; Jochen Schwaer; Baerbel Schwaer; Thomas Schletterer; Artur Hoegele; Armin Schoeppach

Archive | 1992

Adaptive diaphragm mirror with axially movable concentric knife-edges - employs straight-line piezoelectric positioner of outer knife-edge for adjustment of concavity giving stabilised laser power

Wolfgang Rupp; Andreas Frommeyer; Ernst-Dieter Knohl

Archive | 2006

Method for improving the imaging properties of a projection objective, and such a projection objective

Olaf Conradi; Heiko Feldmann; Gerald Richter; Sascha Bleidistel; Andreas Frommeyer; Toralf Gruner; Wolfgang Hummel

Archive | 2003

Optical subassembly and projection objective in semiconductor lithography

Andreas Frommeyer; G Fraser Morrison; Wolfgang Keller; Yim-Bun Patrick Kwan; Harald Kirchner; Willi Heintel

Archive | 2007

Projection objective for a microlithography apparatus with improved imaging properties and method for improving the imaging properties of the projection objective

Mariella Beckenbach; Klaus Rief; Andreas Bertele; Benjamin Sigel; Sascha Bleidistel; Wolfgang Hummel; Andreas Frommeyer; Toralf Gruner; Jochen Schwaer; Baerbel Schwaer; Thomas Schletterer; Artur Hoegele; Armin Schoeppach

Archive | 2008

Projection lens for micro lithography, has multiple lenses with local optical axis, where one lens is assigned to manipulator with actuators, and input force or input torque is attained by former actuators

Sascha Bleidistel; Andreas Frommeyer; Toralf Gruner; Artur Högele; Wolfgang Hummel; Thomas Schletterer; Armin Schöppach; Bärbel Schwaer; Jochen Schwaer

Archive | 2004

Method of producing aspherical optical surfaces

Ernst-Dieter Knohl; Andreas Frommeyer; Hermann Schubert

Archive | 2003

PROJECTION OBJECTIVE FOR SEMICONDUCTOR LITHOGRAPHY

Willi Heintel; Harald Kirchner; Wolfgang Keller; Yim-Bun Patrick Kwan; Andreas Frommeyer; Fraser Morrison

Archive | 2009

Optical component for lithography lens in projection illumination system for manufacturing semiconductor components, has sections whose resistance is selected, so that point remains at location, during temperature gradient occurrence

Armin Schöppach; Franz Sorg; Andreas Frommeyer

Archive | 2015

Projektionsobjektiv mit Wellenfrontmanipulator

Maike Trenkel-Lenz; Wolfgang Scherm; Holger Walter; Vladimir Kamenov; Michael Stolz; Johannes Lippert; Axel Lorenz; Andreas Frommeyer; Claudia Ekstein; Pascal Marsollek; Stephanus Fengler; Wolfgang Emer; Ulrich Löring; Boris Bittner

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Sascha Bleidistel

Carl Zeiss AG

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Toralf Gruner

Carl Zeiss AG

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Wolfgang Hummel

Carl Zeiss AG

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Klaus Rief

Carl Zeiss AG

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Jochen Schwaer

Carl Zeiss AG

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Thomas Schletterer

Carl Zeiss AG

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Andreas Bertele

Carl Zeiss AG

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Armin Schoeppach

Carl Zeiss AG

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Artur Hoegele

Carl Zeiss AG

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Baerbel Schwaer

Carl Zeiss AG

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