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Astronomical Telescopes and Instrumentation | 1998

Status of the secondary mirrors (M2) for the Gemini 8-m telescopes

Ernst-Dieter Knohl; Armin Schoeppach; Michael A. Pickering

The 1-m diameter lightweight secondary mirrors (M2) for the Gemini 8-m telescopes will be the largest CVD-SiC mirrors ever produced. The design and manufacture of these mirrors is a very challenging task. In this paper we will discuss the mirror design, structural and mechanical analysis, and the CVD manufacturing process used to produce the mirror blanks. The lightweight design consist of a thin faceplate (4-mm) and triangular backstructure cells with ribs of varying heights. The main drivers in the design were weight (40 kg) and manufacturing limitations imposed on the backstructure cells and mirror mounts. Finite element modeling predicts that the mirror design will meet all of the Gemini M2 requirements for weight, mechanical integrity, resonances, and optical performance. Special design considerations were necessary to avoid stress concentration in the mounting areas and to meet the requirement that the mirror survive an 8-g earthquake. The highest risk step in the mirror blank manufacturing process is the near-net-shape CVD deposition of the thin, curved faceplate. Special tooling and procedures had to be developed to produce faceplates free of fractures, cracks, and stress during the cool-down from deposition temperature (1350 C) to room temperature. Due to time delay with the CVD manufacturing process in the meantime a backup solution from Zerodur has been started. This mirror is now in the advanced polishing process. Because the design of both mirrors is very similar an excellent comparison of both solutions is possible.


Archive | 2004

Holding Device for an Optical Element in an Objective

Bernhard Gellrich; Andreas Wurmbrand; Jens Kugler; Armin Schoeppach; Christian Zengerling; Stephane Bruynooghe


Archive | 2008

Optical element unit

Armin Schoeppach; Johannes Rau


Archive | 2009

Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

Guido Limbach; Franz Sorg; Armin Schoeppach; Ulrich Weber; Ulrich Loering; Dirk Hellweg; Peter Meyer; Stefan Xalter; Jens Kugler; Bernhard Gellrich; Stefan Hembacher; Bernhard Geuppert; Aksel Goehnermeier


Archive | 2009

PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD

Mariella Beckenbach; Klaus Rief; Andreas Bertele; Benjamin Sigel; Sascha Bleidistel; Wolfgang Hummel; Andreas Frommeyer; Toralf Gruner; Jochen Schwaer; Baerbel Schwaer; Thomas Schletterer; Artur Hoegele; Armin Schoeppach


Archive | 2005

Objective with at least one optical element

Johannes Rau; Armin Schoeppach; Ulrich Weber


Archive | 2007

Projection objective for a microlithography apparatus with improved imaging properties and method for improving the imaging properties of the projection objective

Mariella Beckenbach; Klaus Rief; Andreas Bertele; Benjamin Sigel; Sascha Bleidistel; Wolfgang Hummel; Andreas Frommeyer; Toralf Gruner; Jochen Schwaer; Baerbel Schwaer; Thomas Schletterer; Artur Hoegele; Armin Schoeppach


Archive | 2006

ARRANGEMENT FOR MOUNTING AN OPTICAL COMPONENT

Armin Schoeppach; Christian Zenger Ling


Archive | 2011

Gravitation compensation for optical elements in projection exposure apparatuses

Norbert Muehlberger; Thorsten Rassel; Armin Schoeppach; Juergen Fischer; Matthias Orth


Archive | 2005

Device for holding a beam splitter element

Ulrich Weber; Alexander Kohl; Hubert Holderer; Armin Schoeppach; Erwin Gaber; Winfried Kaiser; Reiner Garreis; Toralf Gruner; Chris Reed; Mike Meehan

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