Ara Philipossian
Hitachi
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Publication
Featured researches published by Ara Philipossian.
Proceedings of International Conference on Planarization/CMP Technology 2014 | 2014
Yun Zhuang; Yasa Sampurno; Leonard Borucki; Ara Philipossian
In this study, a novel slurry injection system (SIS) is introduced. SIS is placed on top of the pad which conformally rides on the pad surface during polishing and presents a thin and uniform slurry film to the wafer. Examples of SIS installed on various 200 and 300 mm commercial polishers are shown. Removal rate and polishing defects are compared between SIS and the conventional pad center area slurry application method. Through more efficient slurry delivery and reduced slurry mixing and dilution, SIS has achieved more uniform slurry flow, higher material removal rate or the same removal rate with significantly lower slurry consumption, and lower number of wafer-level polishing defects than the conventional slurry application method.
Archive | 2009
Leonard Borucki; Yun Zhuang; Yasa Sampurno; Ara Philipossian
Archive | 2009
Ara Philipossian; Yasa Sampurno; Yun Zhuang
Archive | 2012
Leonard Borucki; Yasa Sampurno; Ara Philipossian
Archive | 2009
Leonard Borucki; Yasa Sampurno; Sian Theng; Ara Philipossian
Archive | 2008
Toranosuke Ashizawa; Masaya Nishiyama; Ara Philipossian; Yun Zhuang; Yasa Adi Sampurno; Fransisca Sudargho
Archive | 2008
Yasa Sampurno; Ara Philipossian; Akinobu Teramoto; Takenao Nemoto
Archive | 2008
Leonard Borucki; Ara Philipossian; Masanori Furukawa; Koichiro Ichikawa
Archive | 2011
Leonard Borucki; Yasa Sampurno; Ara Philipossian
Archive | 2010
Ara Philipossian; Michael Goldstein; Yasa Sampurno
