Masaya Nishiyama
Hitachi
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Publication
Featured researches published by Masaya Nishiyama.
Japanese Journal of Applied Physics | 2006
Masato Yoshida; Hiroshi Ono; Masaya Nishiyama; Toranosuke Ashizawa; Toshiro Doi
The effect of pad surface roughness on SiO2 removal rate was investigated using four different slurries containing ceria (CeO2) powders of different crystallite sizes and mean particle sizes. A clear maximum was observed in the dependence of removal rate on pad surface roughness. The four ceria slurries showed a peak in blanket wafer removal rate against pad surface roughness Ra. The peak moved toward larger Ra values with decreasing ceria crystallite size. The removal rate was strongly influenced not only by pad surface roughness but also by the crystallite size of ceria in the slurry.
Archive | 2002
Youichi Machii; Naoyuki Koyama; Masaya Nishiyama; Masato Yoshida
Archive | 2006
Masaya Nishiyama; Kazuhiro Enomoto; Masato Fukasawa; Toshiaki Akutsu; Yuuto Otsuki; Toranosuke Ashizawa
Archive | 2004
Masao Suzuki; Hiroshi Nakagawa; Masato Yoshida; Masaya Nishiyama; Yasuo Shimamura
Archive | 2006
Masaya Nishiyama; Masato Fukasawa; Toshiaki Akutsu; Kazuhiro Enomoto; Toranosuke Ashizawa; Yuuto Ootsuki
Archive | 2008
Naoyuki Koyama; Yoichi Machii; Masaya Nishiyama; Masato Yoshida; 誠人 吉田; 直之 小山; 洋一 町井; 雅也 西山
Archive | 2010
Hiroshi Nakagawa; Toranosuke Ashizawa; Takenori Narita; Masaya Nishiyama
Archive | 2008
Toranosuke Ashizawa; Masaya Nishiyama; Ara Philipossian; Yun Zhuang; Yasa Adi Sampurno; Fransisca Sudargho
Archive | 2010
Masaya Nishiyama; Masato Fukasawa; Toshiaki Akutsu; Kazuhiro Enomoto; Toranosuke Ashizawa; Yuuto Ootsuki
Archive | 2009
Masaya Nishiyama; Kazuhiro Enomoto; Masato Fukasawa; Toshiaki Akutsu; Yuuto Otsuki; Toranosuke Ashizawa
