Arthur H. Sato

Inductively coupled plasma reactor with an inductive coil antenna having independent loops

Pulsed RF power delivery for plasma processing

Plasma reactors for processing semi-conductor wafers

Plasma assisted processing chamber with separate control of species density

Plasma reactor with dynamic RF inductive and capacitive coupling control

Capacitive probe for in situ measurement of wafer DC bias voltage

Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor

Plasma reactor with a segmented balanced electrode for sputtering process materials from a target surface

Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling

Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same