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electronic components and technology conference | 1995

Yield management in microelectronic manufacturing

Badih El-Kareh; Ashwin Kantilal Ghatalia; A.V.S. Satya

Semiconductor technology trends continue to drive toward cheaper, faster, denser, lower-power, and more reliable products. These trends are however, neither independent of nor conducive to each other. Faster and denser designs, for example, increase power, reduce yield and reliability, and increase cost. In many cases, a trade-off is made between cost and performance. The prime factor in determining the cost of a product is its manufacturing yield. It has hence become increasingly important to understand the intricate relationships between process technology, product design, manufacturing tools, and yield. The ability to predict yield long before the product is manufactured is fundamental to a decision-making process during the development phase. Accelerated yield-learning is the next step to reducing the development-to-market time and product cost. Several disciplines should progress coherently to define a yield plan and assure meeting the desired yield targets. Special test structures are designed and tested for yield at different stages of the process to determine the dominant yield detractors, the nature of defects, their size and spatial distributions, and their impact on yield. Models are developed to extract yield parameters from test results and predict the product yield. Systematic and gross defects are mostly eliminated early in the development. The impact of random defect size and density increases with minimum feature size. Tool, process, and design changes are hence made to reduce the defect density to a level that can be tolerated by the specific design. Yield learning is vigorously pursued via measurements against the targets, establishing action plans and tightening the targets in a cyclical mode. The purpose of this paper is to describe the yield management methodology and to provide an overview of the steps required to analyze, predict, and accelerate the product yield learning. Practical examples based on memory and logic designs are discussed.


Archive | 1994

MOSFET with raised STI isolation self-aligned to the gate stack

Wendell P. Noble; Ashwin Kantilal Ghatalia; Badih El-Kareh


Archive | 1975

Electrical defect monitor structure

James Hsi-Tang Lee; Akella Venkata Surya Satya; Ashwin Kantilal Ghatalia; Donald R. Thomas


Archive | 1996

Method for fabricating a MOSFET with raised STI isolation self-aligned to the gate stack

Wendell P. Noble; Ashwin Kantilal Ghatalia; Badih El-Kareh


Archive | 1987

Method of making a contact to a trench isolated device

Badih El-Kareh; Richard Raymond Garnache; Ashwin Kantilal Ghatalia


Archive | 1977

Field effect transistor monitors

Ashwin Kantilal Ghatalia


Archive | 1972

Continuous vapor processing apparatus and method

Richard Raymond Garnache; Ashwin Kantilal Ghatalia; Ronald Adrian Michaud


Archive | 1987

Procédé pour réaliser un contact avec un composant isolé par une tranchée

Badih El-Kareh; Richard Raymond Garnache; Ashwin Kantilal Ghatalia


Archive | 1987

Verfahren zur ausbildung eines kontaktes zu einem durch eine graben isolierten bauelement. A method for training a contact to a dig through a component-insulated.

Badih El-Kareh; Richard Raymond Garnache; Ashwin Kantilal Ghatalia


Archive | 1987

A method of forming a contact device to an isolated by a trench.

Badih El-Kareh; Richard Raymond Garnache; Ashwin Kantilal Ghatalia

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