Baosuo Zhou

Simplified pitch doubling process flow

Protective coating for planarization

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Trim process for critical dimension control for integrated circuits

Method for forming high density patterns

Etch process used during the manufacture of a semiconductor device and systems including the semiconductor device

Methods for integrated circuit fabrication with protective coating for planarization

Procédé de formation de motifs haute densité

Verfahren zur bildung von hochdichten strukturen

Method for forming and planarizing adjacent regions of an integrated circuit