Krupakar M. Subramanian

Protective coating for planarization

Methods of etching trenches into silicon of a semiconductor subtrate, methods of forming trench isolation in silicon of a semiconductor substrate, and methods of forming a plurality of diodes

Nanoimprint lithography template techniques for use during the fabrication of a semiconductor device and systems including same

Voltage-controlled semiconductor inductor and method

Etch process used during the manufacture of a semiconductor device and systems including the semiconductor device

System for controlling placement of nanoparticles and methods of using same

Method and apparatus to sort nanotubes

Methods for integrated circuit fabrication with protective coating for planarization

Methods for forming nanodots and/or a patterned material during the formation of a semiconductor device

Methods of forming trench isolation in silicon of a semiconductor substrate by plasma