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Dive into the research topics where Bastian Trauter is active.

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Featured researches published by Bastian Trauter.


Proceedings of SPIE | 2010

Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems

Andre Engelen; Oscar Noordman; Gert Streutker; Bert van Drieenhuizen; Cas van Nuenen; Wilfred Edward Endendijk; Jef Verbeeck; Wim Bouman; Anita Bouma; Robert Kazinczi; Robert John Socha; Dirk Jürgens; Joerg Zimmermann; Bastian Trauter; Joost Bekaert; Bart Laenens; Daniel Corliss; Greg McIntyre

This paper describes the principle and performance of FlexRay, a fully programmable illuminator for high NA immersion systems. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical elements and changing lens positions. On demand (freeform) source availability allows for reduction in R&D cycle time and shrink in k1. Unlimited tuning allows for better machine to machine matching. FlexRay has been integrated in a 1.35NA TWINSCAN exposure system. We will present data of FlexRay using measured traditional and freeform illumination sources. In addition system performance qualification data on stability, reproducibility and imaging will be shown. The benefit of FlexRay for SMO enabling shrink is demonstrated using an SRAM example.


Proceedings of SPIE | 2008

Analysis of the uniqueness of an inverse grating characterization method

Bastian Trauter; Jochen Hetzler; Karl-Heinz Brenner

We propose a method for the characterization of one- and two-dimensional diffraction gratings by means of the measurement of diffraction efficiencies. The method is based on the comparison of measured and calculated efficiencies. For the numerical calculation we use the Rigorous Coupled Wave Analysis RCWA and an optimization algorithm to determine the grating shape that fits best to the measured data. We analyzed in which cases the method is able to determine the grating shape without ambiguity and which measurement parameters should be used. By systematically analyzing a given inverse problem, we try to derive the theoretical limits of the method.


Archive | 2007

Diffractive optical element for operating wavelength for microelectronics, comprises binary structuring in subarea, and binary structuring comprises different strip densities at two positions of former subarea smaller than certain amount

Jochen Hetzler; Bastian Trauter


Archive | 2014

METHOD FOR ADJUSTING AN OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Ingo Saenger; Bastian Trauter


Archive | 2013

Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zur Justage eines optischen Systems

Ingo Sänger; Michael Patra; Christoph Hennerkes; Bastian Trauter


Archive | 2013

Optical system of a microlithographic projection exposure apparatus, and method for adjusting an optical system

Ingo Sänger; Michael Patra; Christoph Hennerkes; Bastian Trauter


Archive | 2013

Verfahren zur Justage eines optischen Systems einer mikrolithographischen Projektionsbelichtungsanlage

Ingo Sänger; Bastian Trauter


Archive | 2012

An optical system of a microlithographic projection exposure apparatus, and methods for adjustment of an optical system

Ingo Sänger; Michael Patra; Christoph Hennerkes; Bastian Trauter


Archive | 2012

Verfahren zur Justage eines optischen Systems einer mikrolithographischen Projektionsbelichtungsanlage Method for adjusting an optical system of a microlithography projection exposure apparatus

Ingo Sänger; Bastian Trauter


Archive | 2012

Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zur Justage eines optischen Systems The optical system of a microlithography projection exposure apparatus, and method for adjusting an optical system

Ingo Sänger; Michael Patra; Christoph Hennerkes; Bastian Trauter

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