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Ingo Sänger

Carl Zeiss AG

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Publication

Featured researches published by Ingo Sänger.

Archive | 2012

Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren

Ingo Sänger; Frank Schlesener

Archive | 2013

Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage

Ingo Sänger

Archive | 2013

Optical system for microlithographic projection exposure system for manufacturing e.g. LCDs, has beam-splitting optic element arranged such that degree of polarization of incident light beam is lesser than specified value

Ingo Sänger; Jörg Zimmermann; Johannes Ruoff; Martin Meier; Frank Schlesener; Christoph Hennerkes

Archive | 2013

Optisches System einer mikrolithographischen Projektionsbelichtungsanlage

Olaf Dittmann; Ingo Sänger; Jörg Zimmermann

Archive | 2011

Optical system for a microlithographic projection apparatus

Ingo Sänger; Ralf Scharnweber; Olaf Dittmann; Toralf Gruner; Gundula Weiss; András G. Major; Martin Vogt; Markus Degünther; Johannes Wangler; Thomas Korb; Severin Waldis

Archive | 2013

Optical system for wafer inspection system for detecting wafer defects or impurities, comprises polarization beam splitter, and transmissive optical element that causes rotation of polarization device by linear polarized light

Ingo Sänger; Michael Totzeck; Frank Schlesener; Daniel Krähmer; Reiner Garreis; Bernd Reimann

Archive | 2013

Beleuchtungsoptik für eine Projektionsbelichtungsanlage

Ingo Sänger

Archive | 2013

Facet mirror for e.g. extreme UV (EUV) projection exposure system used in lighting system, has mirror facet unit that varies radius of curvature of mirror facet from specific radius of curvature to another radius of curvature

Ingo Sänger

Archive | 2012

Optical system for microlithographic projection exposure system utilized for manufacturing e.g. LCD, has mirror elements adjusted independent of each other, and retarding layer arranged on reflection surface of one of mirror elements

Ingo Sänger

Archive | 2011

Polarisationsbeeinflussende optische Anordnung, sowie optisches System einer mikrolithographischen Projektionsbelichtungsanlage

Ingo Sänger

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Collaboration

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Frank Schlesener

Carl Zeiss AG

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Christoph Hennerkes

Carl Zeiss AG

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Jörg Zimmermann

Carl Zeiss AG

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Daniel Krähmer

Carl Zeiss AG

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Johannes Ruoff

Carl Zeiss AG

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Bastian Trauter

Carl Zeiss AG

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Martin Meier

Carl Zeiss AG

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Olaf Dittmann

Carl Zeiss AG

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Aksel Göhnermeier

Carl Zeiss AG

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Michael Patra

Carl Zeiss AG

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