Bongjae Kwon
Samsung
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Featured researches published by Bongjae Kwon.
international solid-state circuits conference | 2016
Taejoong Song; Woojin Rim; Sunghyun Park; Yongho Kim; Jong-Hoon Jung; Giyong Yang; Sanghoon Baek; JaeSeung Choi; Bongjae Kwon; Yunwoo Lee; Sung-Bong Kim; Gyu-Hong Kim; Hyo-sig Won; Ja-hum Ku; Sunhom Steve Paak; Eun-ji Jung; Steve Sungho Park; Kinam Kim
The power consumption of a mobile application processor (AP) is strongly limited by the SRAM minimum operating voltage, VMIN [1], since the 6T bit cell must balance between write-ability and bit cell stability. However, the SRAM VMIN scales down gradually with advanced process nodes due to increased variability. This is evident with the quantized device-width and limited process-knobs of a FinFET technology, which has greatly affected SRAM design [2-4]. Therefore, assist-circuits are more crucial in a FinFET technology to improve VMIN, which in turn adds to the Power, Performance, and Area (PPA) gain of SRAM.
IEEE Journal of Solid-state Circuits | 2017
Taejoong Song; Woojin Rim; Sunghyun Park; Yongho Kim; Giyong Yang; Hoonki Kim; Sanghoon Baek; Jong-Hoon Jung; Bongjae Kwon; Sungwee Cho; Hyun-Taek Jung; Yongjae Choo; JaeSeung Choi
Two 128 Mb 6T SRAM test chips are implemented in a 10 nm FinFET technology. A 0.040 μm2 6T SRAM bitcell is designed for high density (HD), and 0.049 μm2 for high performance (HP). The various SRAM assist schemes are explored to evaluate the power, performance, and area (PPA) gain, and the figure-of-merit (FOM) is induced by the minimum operating voltage (VMIN) and assist overheads. The dual-transient wordline scheme is proposed to improve the VMIN by 47.5 mV for the 128 Mb 6T-HP SRAM. The suppressed bitline scheme with negative bitline improves the VMIN by 135 mV for the 128 Mb 6T-HD SRAM. The FOM of PPA gain evaluates the optimum SRAM assist for the different bitcells based on the applications.
international solid-state circuits conference | 2017
Taejoong Song; Hoonki Kim; Woojin Rim; Yongho Kim; Sunghyun Park; Changnam Park; Minsun Hong; Giyong Yang; Jeongho Do; Jinyoung Lim; Seung-Young Lee; Ingyum Kim; Sanghoon Baek; Jong-Hoon Jung; Dae-Won Ha; Hyung-Soon Jang; Taejung Lee; Chul-Hong Park; Bongjae Kwon; Hyun-Taek Jung; Sungwee Cho; Yongjae Choo; JaeSeung Choi
Conventional patterning techniques, such as self-aligned double patterning (SADP) and litho-etch-litho-etch (LELE), have paved the way for the extreme ultraviolet (EUV) technology that aims to reduce the photomask steps [1,2]. EUV adds the extreme scaling to the high-performance of FinFET technology, thus opening up new opportunities for system-on-chip designers: delivering power, performance, and area (PPA) competitiveness. In terms of area, peripheral logic has scaled down aggressively in comparison to the bitcell given the intense design-rule shrinkage. Figure 12.2.1 shows the bitcell scaling trend and the peripheral logic unit area across different process nodes. Compared to the 10nm process node, the peripheral logic unit area is closer to the bitcell area in a 7nm process node aided by EUV, which allows bi-directional metal lines for scaling. Complex patterns and intensive scaling induce defective elements in the SRAM peripheral logic. Therefore, the probability of yield-loss due to defects is high, which necessitates the need for a repair scheme for the peripheral logic in addition to the SRAM bitcell. Despite the varied literature on bitcell repair, such as the built-in self-repair that analyzes the faulty bitcells to allocate the repair efficiently for a higher repairable rate [3], literature that discusses peripheral logic repair is sparse. Early literature [4] discusses the usage of a sense-amplifier, designed with redundancy, to address the sense-amplifier offset. Nevertheless, it is not related to the peripheral logic repair for yield improvement. This paper exclusively addresses the peripheral logic repair issue to achieve a higher repairable rate. A separate analysis of SRAM macro defect failures, in the bitcell and peripheral logic, provides a deeper understanding so as to increase the maximum repairable rate under random defect conditions.
asian solid state circuits conference | 2010
Kyoung-Hoi Koo; Jaejin Park; Dong-Uk Park; Eon-Guk Kim; Seungho Lee; Bongjae Kwon; Young-Keun Lee; Kyu-Myung Choi
A Clock-shared differential signaling(CSDS) transmitter is fabricated in 0.13 μm CMOS for 120 Hz 10-bit Full HD TVs. The proposed Tx driver takes advantages of PVT-insensitive tunable termination resistance with double feedback loops, and small reference voltage fluctuation. Moreover, a fully-digital duty cycle corrector is proposed, and compared to non-clock spreading, the relative near-field EMI level of multi-phase clock spreading is enhanced by 4.4 dB at the operating frequency of 500 MHz. The CSDS Tx with 34 channels consumes 300mW at a 2.5 V power supply and 1.0Gb/s/ch.
Archive | 2004
Chanhee Jeon; Bongjae Kwon; Eun-kyoung Kyonggi Kwon
Archive | 2006
Bongjae Kwon
Archive | 2005
Byeong-Yun Kim; Jung-Su Ryu; Bongjae Kwon
international solid-state circuits conference | 2018
Taejoong Song; Jong-Hoon Jung; Woojin Rim; Hoonki Kim; Yongho Kim; Changnam Park; Jeongho Do; Sunghyun Park; Sungwee Cho; Hyun-Taek Jung; Bongjae Kwon; Hyun-su Choi; JaeSeung Choi; Jong Shik Yoon
Archive | 2011
Chan-hee Kyonggi Jeon; Bongjae Kwon; Eun-kyoung Kyonggi Kwon
Archive | 2004
Chan-hee Kyonggi Jeon; Bongjae Kwon; Eun-kyoung Kyonggi Kwon