Catharina Pusch

Method for the manufacture of micro-mechanical components

Memory with trench capacitor and selection transistor and method for fabricating it

Method for fabricating epitaxy layer

Production of epitaxial layer for dynamic random access memory comprises preparing substrate having single crystalline and insulated regions, growing epitaxial layer on single crystalline region and partially removing epitaxial layer

Memory with a trench capacitor and a selection transistor and method for producing the same

Polishing agent and use thereof to planish a semiconductor substrate

Verfahren zur Herstellung von mikromechanischen Bauelementen A process for preparing micromechanical components

A process for preparing micromechanical components

POLISHING AGENT, METHOD FOR CHEMICAL AND MECHANICAL PLANISHING AND USE OF SAID POLISHING AGENT TO PLANISH A SEMICONDUCTOR SUBSTRATE

Speicher mit Grabenkondensator und Auswahltransistor und Verfahren zu seiner Herstellung Storage capacitor with grave and selection transistor and method for its preparation