Charles Steven Rhoades

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Featured researches published by Charles Steven Rhoades.

Archive | 1994

Passivating, stripping and corrosion inhibition of semiconductor substrates

Jian Chen; James S. Papanu; Steve S. Y. Mak; Carmel Ish-Shalom; Peter Hsieh; Wesley Lau; Charles Steven Rhoades; Brian Shieh; Ian S. Latchford; Karen A. Williams; Victoria Yu-Wang

Archive | 1993

Etching aluminum and its alloys using HC1, C1-containing etchant and N.sub.2

Diana M. Xiaobing; Charles Steven Rhoades

Archive | 1993

Plasma dry cleaning of semiconductor processing chambers

Yan Ye; Charles Steven Rhoades; Gerald Zheyao Yin

Archive | 1994

Dry cleaning of semiconductor processing chambers.

Yan Ye; Charles Steven Rhoades; Gerald Zheyao Yin

Archive | 1995

Controlling plasma particulates by contouring the plasma sheath using materials of differing RF impedances

Robert J. Steger; Charles Steven Rhoades; Anand Gupta

Archive | 1993

Method for reducing particulate contamination during plasma processing of semiconductor devices

Anand Gupta; Charles Steven Rhoades; Yan Ye; Joseph Lanucha

Archive | 1997

Dry cleaning of semiconductor processing chambers using non-metallic, carbon-comprising material

Yan Ye; Charles Steven Rhoades; Gerald Zheyao Yin

Archive | 1995

STRIPPING, PASSIVATION AND CORROSION INHIBITION OF SEMICONDUCTOR SUBSTRATES

Jian Chen; Peter Hsieh; Carmel Ish-Shalom; Wesley Lau; James S. Papanu; Steve S. Y. Mak; Charles Steven Rhoades; Brian Shieh; Scott Ian Latchford; Karen A. Williams; Victoria Yu-Wang

Archive | 1994