Choshu Ito
LSI Corporation
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Publication
Featured researches published by Choshu Ito.
IEEE Transactions on Electron Devices | 2002
Choshu Ito; Kaustav Banerjee; Robert W. Dutton
Electrostatic discharge (ESD) protection devices can have an adverse effect on the performance of high-speed mixed-signal and RF circuits. This paper presents quantitative methodologies to analyze the performance degradation of these circuits due to ESD protection. A detailed S-parameter-based analysis of these high-frequency systems illustrates the utility of the distributed ESD protection scheme and the impact of the parasitics associated with the protection devices. It is shown that a four-stage distributed ESD protection can be beneficial for frequencies up to 10 GHz. In addition, two generalized design optimization methodologies incorporating coplanar waveguides are developed for the distributed structure to achieve a better impedance match over a broad frequency range (0-10 GHz). By using this optimized design, an ESD device with a parasitic capacitance of 200 fF attenuates the RF signal power by only 0.27 dB at 10 GHz. Furthermore, termination schemes are proposed to allow this analysis to be applicable to high-speed digital and mixed-signal systems.
electrical overstress/electrostatic discharge symposium | 2005
Wolfgang Soldner; Martin Streibl; Uwe Hodel; Marc Tiebout; Harald Gossner; Doris Schmitt-Landsiedel; Jung-Hoon Chun; Choshu Ito; Robert W. Dutton
The present work is focussed on the trade off between conventional RF ESD protection concepts optimized in terms of capacitive load and the frequently discussed RF ESD codesign idea with ESD protection skilfully integrated into RF circuit design. A narrow and a broadband RF test circuit were developed to put the benchmark on a firm basis. RF and ESD experiments are discussed, showing where the higher effort for the codesign approach starts to pay off.
IEEE Transactions on Electron Devices | 2009
Tze Wee Chen; Choshu Ito; William Loh; Wei Wang; Kalyan Doddapaneni; Subhasish Mitra; Robert W. Dutton
A design methodology and protection strategy for ESD charged-device-model (CDM) robust digital systems is presented using a scalable postbreakdown transistor macromodel for 90- and 130-nm technologies. The macromodel was implemented in a design tool to aid reliable chip design and used to predict function failure in three different system-on-chip design examples. Simulations agree well with failure analysis observations, verifying the validity of the macromodel. A ldquocorrect-by-constructionrdquo protection strategy for overcoming induced ESD-CDM events is also proposed. No ESD-CDM-related function failures are observed for product chips protected with this strategy.
international symposium on quality electronic design | 2001
Choshu Ito; Kaustav Banerjee; Robert W. Dutton
Electrostatic discharge (ESD) protection devices can have an adverse effect on the performance of high frequency and RF circuits. This work presents for the first time, an S-parameter based analysis of the performance of RF circuits with various ESD protection designs. Additionally, a design methodology for distributed ESD protection using coplanar waveguides is developed to achieve a better impedance match over a broad frequency range. By using this technique, an ESD device with a parasitic capacitance of 200 fF will attenuate the signal power by only 0.27 dB at 10 GHz.
Microelectronics Reliability | 2006
Tze Wee Chen; Choshu Ito; William Loh; Robert W. Dutton
Sub-nanosecond pulses were used to stress gate capacitors and the post-breakdown leakage resistance is analyzed. Post-breakdown leakage resistance obtained using sub-nanosecond pulse stress and ramp voltage stress are compared, and a power-law relationship between the inverse of the post-breakdown leakage resistance and device area is observed.
electrical overstress electrostatic discharge symposium | 2007
Tze Wee Chen; Choshu Ito; Timothy J. Maloney; William Loh; Robert W. Dutton
An Ultra-fast Transmission Line Pulsing (UFTLP) system is demonstrated. Very short pulses down to 40 ps with a large voltage range (up to 100 V in this work) can be generated. Gate oxide reliability is quantified in the 100 ps regime for the first time. Hard and soft breakdown transitions are clearly captured, and the results explain why some logic cells still function after breakdown events.
international reliability physics symposium | 2007
Tze Wee Chen; Choshu Ito; William Loh; Wei Wang; Subhasish Mitra; Robert W. Dutton
A post-breakdown transistor macro-model for 90nm and 130nm technologies is presented and experimentally verified. Oxide breakdown does not necessarily imply function failure. The location of breakdown within the circuit is also important. A simulation methodology implementing this macro-model is presented. This tool can be used to predict function failure for three different system-on-chip (SoC) design examples. Simulations agree well with failure analysis (FA) observations, verifying the validity of the macro-model
Microelectronics Reliability | 2002
Choshu Ito
Electrostatic discharge (ESD) protection devices can have an adverse effect on the performance of high-speed mixed-signal and RF circuits. This work presents a detailed s-parameter based analysis of the performance of these circuits with special attention to the distributed ESD protection designs. It has been shown that a 4-stage distributed ESD protection can be beneficial at frequencies greater than 3 GHz. Two generalized design optimization methodologies using coplanar waveguides are developed for the distributed structure to achieve a better impedance match over a broad frequency range. By using this optimized design, an ESD device with a parasitic capacitance of 200 fF will attenuate the RF signal power by only 0.27 dB at 10 GHz. A design strategy is also suggested for high-speed mixed-signal ICs.
Archive | 2004
Choshu Ito; Olof Tornblad; Gordon Ma; Robert W. Dutton
In RF power device design, much of the analysis is based on measurements. Complete analysis by simulation is often avoided because the high-frequency, largesignal operation makes device simulation unsuitable, and the difficulties in obtaining a good physical compact model make circuit simulation inaccurate. This work presents a methodology that overcomes these limitations by utilizing a combination of device and circuit simulations to characterize large-signal operation of RF power devices quickly and accurately. Results show that circuit simulations using an extracted Root model agree well with device simulation for the intrinsic device. It is also demonstrated that changes in device design are reflected in circuit-level RF performance.
Archive | 2012
Choshu Ito; Erik Chmelar