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D. Pinson Ii Jay

Applied Materials

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Publication

Featured researches published by D. Pinson Ii Jay.

Archive | 1993

Silicon scavenger in an inductively coupled RF plasma reactor

Kenneth S. Collins; Craig A. Roderick; John Trow; Chan-Lon Yang; Jerry Y. Wong; Jeffrey Marks; Peter R. Keswick; David W. Groechel; D. Pinson Ii Jay; Tetsuya Ishikawa; Lawrence C. Lei; Masato Toshima; Gerald Zheyao Yin

Archive | 1993

Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits

Kenneth S. Collins; John Trow; Craig A. Roderick; D. Pinson Ii Jay; A. Buchberger Ii Douglas; Robert P. Hartlage; Viktor Shel

Archive | 2000

Plasma reactor using inductive RF coupling, and processes

Kenneth S. Collins; Chan-Lon Yang; Jerry Yuen-Kui Wong; Jeffrey Marks; Peter R. Keswick; David W. Groechel; Craig A. Roderick; John Trow; Tetsuya Ishikawa; D. Pinson Ii Jay; Lawrence Chang-Lai Lei; Masato Toshima; Gerald Zheyao Yin

Archive | 1992

Electronically tuned matching network using predictor-corrector control system

Kenneth S. Collins; John Trow; Craig A. Roderick; D. Pinson Ii Jay; A. Buchberger Ii Douglas

Archive | 1993

Process used in an RF coupled plasma reactor

Kenneth S. Collins; Craig A. Roderick; John Trow; Chan-Lon Yang; Jerry Yuen-Kui Wong; Jeffrey Marks; Peter R. Keswick; David W. Groechel; D. Pinson Ii Jay; Tetsuya Ishikawa; Lawrence Chang-Lai Lei; Masato Toshima

Archive | 2000

Magnetic confinement in a plasma reactor having an RF bias electrode

Kenneth S. Collins; Chan-Lon Yang; Jerry Yuen-Kui Wong; Jeffrey Marks; Peter R. Keswick; David W. Groechel; Craig A. Roderick; John Trow; Tetsuya Ishikawa; D. Pinson Ii Jay; Lawrence Chang-Lai Lei; Masato Toshima; Gerald Zheyao Yin

Archive | 1997

Plasma etch processes

Kenneth S. Collins; Craig A. Roderick; John Trow; Chan-Lon Yang; Jerry Yuen-Kui Wong; Jeffrey Marks; Peter R. Keswick; David W. Groechel; D. Pinson Ii Jay; Tetsuya Ishikawa; Lawrence Chang-Lai Lei; Masato Toshima; Gerald Zheyao Yin

Archive | 2011

Loadlock batch ozone cure

Dmitry Lubomirsky; D. Pinson Ii Jay; Kirby H. Floyd; Adib Khan; Shankar Venkataraman

Archive | 2011

Module for ozone cure and post-cure moisture treatment

Dmitry Lubomirsky; D. Pinson Ii Jay; Kirby H. Floyd; Adib Khan; Shankar Venkataraman

Archive | 2000

System for polishing and cleaning substrates

D. Pinson Ii Jay; Arulkumar Shanmugasundram

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Craig A. Roderick

Applied Materials

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John Trow

Applied Materials

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Kenneth S. Collins

Applied Materials

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Chan-Lon Yang

Applied Materials

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David W. Groechel

Applied Materials

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Jeffrey Marks

Applied Materials

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Masato Toshima

Applied Materials

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Peter R. Keswick

Applied Materials

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Tetsuya Ishikawa

Applied Materials

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Gerald Zheyao Yin

Applied Materials

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