Daniel K. Schreiber

Catalyst incorporation at defects during nanowire growth.

Scanning and transmission electron microscopy was used to correlate the structure of planar defects with the prevalence of Au catalyst atom incorporation in Si nanowires. Site-specific high-resolution imaging along orthogonal zone axes, enabled by advances in focused ion beam cross sectioning, reveals substantial incorporation of catalyst atoms at grain boundaries in <110> oriented nanowires. In contrast, (111) stacking faults that generate new polytypes in <112> oriented nanowires do not show preferential catalyst incorporation. Tomographic reconstruction of the catalyst-nanowire interface is used to suggest criteria for the stability of planar defects that trap impurity atoms in catalyst-mediated nanowires.

Effects of annealing on local composition and electrical transport correlations in MgO-based magnetic tunnel junctions

The effects of annealing on the electrical transport behavior of CoFe/MgO/CoFe magnetic tunnel junctions have been studied using a combination of site-specific in situ transmission electron microscopy and three-dimensional atom-probe tomography. Annealing leads to an increase in the resistance of the junctions. A shift in the conductance curve (dI/dV) minimum from 0 V for the as-grown specimen correlates with a sharply defined layer of CoFe oxide at the lower ferromagnetic interface. Annealing decreases the asymmetry in the conductance by making the interfaces more diffuse and the tunnel barrier more chemically homogeneous.

Enhanced spin signals due to native oxide formation in Ni80Fe20/Ag lateral spin valves

Large nonlocal spin valve signals are reported in mesoscopic Ni80Fe20/Ag lateral spin valves upon exposing them to air. Magnetotransport measurements combined with transmission electron microscopy show that the formation of a native oxide layer at the Ni80Fe20/Ag interface is responsible for the large signals. The results indicate that lateral spin valves with superior performance to those based on high-resistance tunnel barriers can be achieved via controllable growth of native permalloy oxides.

Effects of elemental distributions on the behavior of MgO-based magnetic tunnel junctions.

Three-dimensional atom-probe tomography and transmission electron microscopy have been utilized to study the effects of Ta getter presputtering and either a Mg or Ru free-layer cap on the elemental distributions and properties of MgO-based magnetic tunnel junctions after annealing. Annealing the samples resulted in crystallization of the amorphous CoFeB layer and diffusion of the majority of the boron away from the crystallized CoFeB layers. The Ta getter presputter is found to reduce the segregation of boron at the MgO/CoFeB interface after annealing, improving the tunneling magnetoresistance of the tunnel junction. This effect is observed for samples with either a Ru free-layer cap or a Mg free-layer cap and is thought to be a result of a reduced oxygen concentration within the MgO due to the effect of Ta getter presputtering. A Ru free-layer cap provides superior magnetic and magnetotransport properties compared to a Mg free-layer cap. Mg from the Mg free-layer cap is observed to diffuse toward the MgO...

Enhanced magnetoresistance in naturally oxidized MgO-based magnetic tunnel junctions with ferromagnetic CoFe/CoFeB bilayers.

Three-dimensional elemental distributions in magnetic tunnel junctions containing naturally oxidized MgO tunnel barriers are characterized using atom-probe tomography. Replacing the CoFeB free layer (reference layer) with a CoFe/CoFeB (CoFeB/CoFe) bilayer increases the magnetoresistance from 105% to 192% and decreases the resistance-area product from 14.5 to 3.4 Ω μm2. The CoFe/CoFeB bilayer improves the compositional uniformity within the free layer by nucleating CoFeB crystals across the entire layer, resulting in a homogeneous barrier/free layer interface. In contrast, the simple CoFeB free layer partially crystallizes with composition differences from grain to grain (5–30 nm), degrading the tunnel junction performance.

A method for directly correlating site-specific cross-sectional and plan-view transmission electron microscopy of individual nanostructures.

A sample preparation method is described for enabling direct correlation of site-specific plan-view and cross-sectional transmission electron microscopy (TEM) analysis of individual nanostructures by employing a dual-beam focused-ion beam (FIB) microscope. This technique is demonstrated using Si nanowires dispersed on a TEM sample support (lacey carbon or Si-nitride). Individual nanowires are first imaged in the plan-view orientation to identify a region of interest; in this case, impurity atoms distributed at crystalline defects that require further investigation in the cross-sectional orientation. Subsequently, the region of interest is capped with a series of ex situ and in situ deposited layers to protect the nanowire and facilitate site-specific lift-out and cross-sectioning using a dual-beam FIB microscope. The lift-out specimen is thinned to electron transparency with site-specific positioning to within ≈ 200 nm of a target position along the length of the nanowire. Using the described technique, it is possible to produce correlated plan-view and cross-sectional view lattice-resolved TEM images that enable a quasi-3D analysis of crystalline defect structures in a specific nanowire. While the current study is focused on nanowires, the procedure described herein is general for any electron-transparent sample and is broadly applicable for many nanostructures, such as nanowires, nanoparticles, patterned thin films, and devices.

Atomic Structural Analysis of Nanowire Defects and Polytypes Enabled Through Cross‐Sectional Lattice Imaging

Correlated transmission electron microscopy imaging, electron diffraction, and Raman spectroscopy are used to investigate the structure of Si nanowires with planar defects. In addition to plan-view imaging, individual defective nanowires are imaged in axial cross-section at specific locations selected in plan-view imaging. This correlated characterization approach enables definitive identification of complex defect structures that give rise to diffraction patterns that have been misinterpreted in the literature. Conclusive evidence for the 9R Si polytype is presented, and the atomic structure of this phase is correlated with kinematically-forbidden reflections in Si diffraction patterns. Despite striking similarities between imaging and diffraction data from twinned nanowires and the 9R polytype, clear distinctions between the structures can be made. Finally, the structural origins of ⅓{422} reflections in Si [111] diffraction patterns are identified.