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Dive into the research topics where Daniel Krähmer is active.

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Featured researches published by Daniel Krähmer.


Optical Microlithography XVIII | 2005

How to describe polarization influence on imaging (Invited Paper)

Michael Totzeck; Paul Gräupner; Tilmann Heil; Aksel Göhnermeier; Olaf Dittmann; Daniel Krähmer; Vladimir Kamenov; Johannes Ruoff; Donis G. Flagello

We give a general introduction into polarized imaging and report on a Jones-pupil approach for a complete evaluation of the resulting optical performance. The Jones pupil assigns a Jones matrix to each point of the exit pupil describing the impact of both the global phase and the polarization on imaging. While we can learn already a lot about the optical system by taking a close look at the Jones pupil - and starting imaging simulations from it - a quantitative assessment is necessary for a complete evaluation of imaging. To do this, we generalize the concept of scalar Zernike aberrations to Jones-Zernike aberrations by expansion of the Jones pupil into vector polynomials. The resulting method is non-paraxial, i.e. the effect of the polarization dependent contrast loss for high numerical apertures is included. The aberrations of the Jones-matrix pupil are a suitable tool to identify the main drivers determining the polarization performance. Furthermore, they enable us to compare the polarized and the unpolarized performance of the such characterized lithographic system.


Archive | 2002

Lens system consisting of fluoride crystal lenses

Daniel Krähmer; Toralf Gruner; Wilhelm Ulrich; Birgit Enkisch; Michael Gerhard; Martin Brunotte; Christian Wagner; Winfried Kaiser; Manfred Maul; Christoph Zaczek


Archive | 2003

Objective with fluoride crystal lenses

Daniel Krähmer; Toralf Gruner; Wilhelm Ulrich; Birgit Enkisch; Michael Gerhard; Martin Brunotte; Christian Wagner; Winfried Kaiser; Manfred Maul; Christoph Zaczek


Archive | 2002

Objective with lenses made of a crystalline material

Michael Gerhard; Daniel Krähmer


Archive | 2002

Compensation of birefringence in a lens composed of crystal lenses

Michael Gerhard; Daniel Krähmer


Archive | 2006

Optical system of a microlithographic exposure system

Michael Totzeck; Susanne Beder; Wilfried Clauss; Heiko Feldmann; Daniel Krähmer; Aurelian Dodoc


Archive | 2007

SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY

Gerhard Fürter; Ulrich Löring; Daniel Krähmer; Aurelian Dodoc; Heiko Feldmann; David Shafer; Wilhelm Ulrich; Holger Walter; Johannes Zellner


Archive | 2004

Microlithography projection system and device manufacturing method

Daniel Krähmer; Wilhelm Ulrich


Proceedings of SPIE, the International Society for Optical Engineering | 2008

Orientation Zernike Polynomials - a systematic description of polarized imaging using high NA lithography lenses

Tilmann Heil; Johannes Ruoff; Jens Timo Neumann; Michael Totzeck; Daniel Krähmer; Bernd Geh; Paul Gräupner


Archive | 2005

Optisches System sowie Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauteile

Daniel Krähmer

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