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Frank Schlesener

Carl Zeiss AG

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Publication

Featured researches published by Frank Schlesener.

Archive | 2013

Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method

Ingo Saenger; Joerg Zimmermann; Johannes Ruoff; Martin Meier; Frank Schlesener; Christoph Hennerkes

Archive | 2012

Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren

Ingo Sänger; Frank Schlesener

Archive | 2006

Polarization influencing optical arrangement for e.g. projection lens system, has optical unit changing distribution in central area of beam cross section, where beam has approximate tangential polarization distribution in central area

Hagen Federau; Damian Fiolka; Joachim Hartjes; Frank Schlesener; Benyamin Slucha; Markus Walter; Markus Weiss

Archive | 2016

METHOD FOR OPERATING AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Oliver Natt; Frank Schlesener

Archive | 2013

Optical system for microlithographic projection exposure system for manufacturing e.g. LCDs, has beam-splitting optic element arranged such that degree of polarization of incident light beam is lesser than specified value

Ingo Sänger; Jörg Zimmermann; Johannes Ruoff; Martin Meier; Frank Schlesener; Christoph Hennerkes

Archive | 2015

METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSITIVE SURFACE AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Frank Schlesener; Ingo Saenger; Olaf Dittmann; Aksel Goehnermeier; Alexandra Pazidis; Thomas Schicketanz; Michael Patra; Markus Deguenther

Archive | 2014

METHOD AND APPARATUS FOR COMPENSATING AT LEAST ONE DEFECT OF AN OPTICAL SYSTEM

Vladimir Dmitriev; Ingo Saenger; Frank Schlesener; Markus Mengel; Johannes Ruoff

Archive | 2015

ILLUMINATION SYSTEM FOR AN EUV LITHOGRAPHY DEVICE AND FACET MIRROR THEREFOR

Johannes Ruoff; Ingo Saenger; Joerg Zimmermann; Daniel Kraehmer; Christoph Hennerkes; Frank Schlesener

Archive | 2014

MIRROR SYSTEM COMPRISING AT LEAST ONE MIRROR FOR USE FOR GUIDING ILLUMINATION AND IMAGING LIGHT IN EUV PROJECTION LITHOGRAPHY

Ingo Saenger; Frank Schlesener

Archive | 2013

Optical system for wafer inspection system for detecting wafer defects or impurities, comprises polarization beam splitter, and transmissive optical element that causes rotation of polarization device by linear polarized light

Ingo Sänger; Michael Totzeck; Frank Schlesener; Daniel Krähmer; Reiner Garreis; Bernd Reimann

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Collaboration

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Ingo Sänger

Carl Zeiss AG

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Johannes Ruoff

Carl Zeiss AG

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Christoph Hennerkes

Carl Zeiss AG

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Ingo Saenger

Carl Zeiss AG

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Jörg Zimmermann

Carl Zeiss AG

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Daniel Krähmer

Carl Zeiss AG

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Vladimir Davydenko

Carl Zeiss AG

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Axel Scholz

Carl Zeiss AG

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Aksel Göhnermeier

Carl Zeiss AG

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Martin Meier

Carl Zeiss AG

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