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David S. Ballance

Applied Materials

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Publication

Featured researches published by David S. Ballance.

Archive | 1996

Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween

David S. Ballance; Benjamin Bierman; James V. Tietz

Archive | 1996

Multi-zone gas flow control in a process chamber

David S. Ballance; Benjamin Bierman; James V. Tietz

Archive | 1996

Sloped substrate support

David S. Ballance; Benjamin Bierman; Robert M. Haney; David W. Lacourt

Archive | 1996

Semiconductor wafer support with graded thermal mass

James V. Tietz; Benjamin Bierman; David S. Ballance

Archive | 1997

Co-rotating edge ring extension for use in a semiconductor processing chamber

Benjamin Bierman; Meredith J. Williams; David S. Ballance; Brian Haas; Paul Deaton; James V. Tietz

Archive | 1997

Method and apparatus for achieving temperature uniformity of a substrate

Meredith J. Williams; David S. Ballance; Benjamin Bierman; Paul Deaton; Brian Haas; Nobuyuki Takahashi; James V. Tietz

Archive | 1997

Apparatus for introducing gas into a rapid thermal processing chamber

David S. Ballance; Benjamin Bierman; James V. Tietz

Archive | 1996

Method for gaseous substrate support

David S. Ballance; Benjamin Bierman; James V. Tietz; Brian Haas

Archive | 1997

Method and apparatus for purging the back side of a substrate

David S. Ballance; Benjamin Bierman; Paul Deaton; Brian Haas; James V. Tietz; Meredith J. Williams

Archive | 1997

Reflector cover for a semiconductor processing chamber

Benjamin Bierman; David S. Ballance; James V. Tietz; Brian Haas; Meredith J. Williams; Paul Deaton

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Collaboration

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Benjamin Bierman

Applied Materials

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James V. Tietz

Applied Materials

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Brian Haas

Applied Materials

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Meredith J. Williams

Applied Materials

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Paul Deaton

Applied Materials

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David W. Lacourt

Applied Materials

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Robert M. Haney

Applied Materials

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Nobuyuki Takahashi

Applied Materials

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