Dimitri Geskus

Gain bandwidth of 80 nm and 2 dB/cm peak gain in Al2O3:Er3+ optical amplifiers on silicon

Erbium-doped aluminum oxide integrated optical amplifiers were fabricated on silicon substrates, and their characteristics were investigated for Er concentrations ranging from 0.27 to 4.2×1020 cm−3. Background losses below 0.3 dB/cm at 1320 nm were measured. For optimum Er concentrations in the range of 1 to 2×1020 cm−3, an internal net gain was obtained over a wavelength range of 80 nm(1500-1580 nm), and a peak gain of 2.0 dB/cm was measured at 1533 nm. The broadband and high peak gain are attributed to an optimized fabrication process, improved waveguide design, and pumping at 977 nm as opposed to 1480 nm. In a 5.4-cm-long amplifier, a total internal net gain of up to 9.3 dB was measured. By use of a rate-equation model, an internal net gain of 33 dB at the 1533 nm gain peak and more than 20 dB for all wavelengths within the telecom C-band (1525-1565 nm) are predicted for a launched signal power of 1 μW when launching 100 mW of pump power into a 24-cm-long amplifier. The high optical gain demonstrates that Al2O3:Er3+ is a competitive technology for active integrated optics.

Reliable Low-Cost Fabrication of Low-Loss Waveguides With 5.4-dB Optical Gain

A reliable and reproducible deposition process for the fabrication of Al₂O₃ waveguides with losses as low as 0.1 dB/cm has been developed. The thin films are grown at ~ 5 nm/min deposition rate and exhibit excellent thickness uniformity within 1% over 50times50 mm² area and no detectable OH^- incorporation. For applications of the Al₂O₃ films in compact, integrated optical devices, a high-quality channel waveguide fabrication process is utilized. Planar and channel propagation losses as low as 0.1 and 0.2 dB/cm, respectively, are demonstrated. For the development of active integrated optical functions, the implementation of rare-earth-ion doping is investigated by cosputtering of erbium during the Al₂O₃ layer growth. Dopant levels between 0.2-5times10²⁰ cm^-3 are studied. At Er³⁺ concentrations of interest for optical amplification, a lifetime of the ⁴I_13/2 level as long as 7 ms is measured. Gain measurements over 6.4-cm propagation length in a 700-nm-thick Al₂O₃:Er³⁺ channel waveguide result in net optical gain over a 41-nm-wide wavelength range between 1526-1567 nm with a maximum of 5.4 dB at 1533 nm.

Giant Optical Gain in a Rare‐Earth‐Ion‐Doped Microstructure

Modal gain per unit length versus launched pump power is predicted and measured in a 47.5 at.% Yb(3+) -doped potassium double tungstate channel waveguide. The highest measured gain exceeds values previously reported for rare-earth-ion-doped materials by two orders of magnitude.

High-power, broadly tunable, and low-quantum-defect KGd1-xLux(WO4)2:Yb3+ channel waveguide lasers

In KGd(1-x)Lu(x)(WO(4))(2):Yb(3+) channel waveguides grown onto KY(WO(4))(2) substrates by liquid phase epitaxy and microstructured by Ar+ beam etching, we produced 418 mW of continuous-wave output power at 1023 nm with a slope efficiency of 71% and a threshold of 40 mW of launched pump power at 981 nm. The degree of output coupling was 70%. By grating tuning in an extended cavity and pumping at 930 nm, we demonstrated laser operation from 980 nm to 1045 nm. When pumping at 973 nm, lasing at 980 nm with a record-low quantum defect of 0.7% was achieved.

Microstructured KY(WO4)2:Gd3+, Lu3+, Yb3+ channel waveguide laser

Epitaxially grown, 2.4-microm-thin layers of KY(WO(4))(2):Gd(3+), Lu(3+), Yb(3+), which exhibit a high refractive index contrast with respect to the undoped KY(WO(4))(2) substrate, have been microstructured by Ar beam milling, providing 1.4-microm-deep ridge channel waveguides of 2 to 7 microm width, and overgrown by an undoped KY(WO(4))(2) layer. Channel waveguide laser operation was achieved with a launched pump power threshold of only 5 mW, a slope efficiency of 62% versus launched pump power, and 76 mW output power.

Reliable low-cost fabrication of low-loss

A reliable and reproducible deposition process for the fabrication of Al₂O₃ waveguides with losses as low as 0.1 dB/cm has been developed. The thin films are grown at ~ 5 nm/min deposition rate and exhibit excellent thickness uniformity within 1% over 50times50 mm² area and no detectable OH^- incorporation. For applications of the Al₂O₃ films in compact, integrated optical devices, a high-quality channel waveguide fabrication process is utilized. Planar and channel propagation losses as low as 0.1 and 0.2 dB/cm, respectively, are demonstrated. For the development of active integrated optical functions, the implementation of rare-earth-ion doping is investigated by cosputtering of erbium during the Al₂O₃ layer growth. Dopant levels between 0.2-5times10²⁰ cm^-3 are studied. At Er³⁺ concentrations of interest for optical amplification, a lifetime of the ⁴I_13/2 level as long as 7 ms is measured. Gain measurements over 6.4-cm propagation length in a 700-nm-thick Al₂O₃:Er³⁺ channel waveguide result in net optical gain over a 41-nm-wide wavelength range between 1526-1567 nm with a maximum of 5.4 dB at 1533 nm.

Al_2O_3:Er^{3+}

Channel waveguide lasers operating at 981 nm are demonstrated in KY(1-x-y)Gd(x)Lu(y)(WO4)2:Yb3+ waveguides grown by liquid phase epitaxy onto undoped KY(WO4)2 substrates and microstructured by Ar+ beam etching. Under pumping at 934 nm of samples with different waveguide geometry and outcoupling degree, a record-high slope efficiency of 76% versus absorbed pump power and a record-high output power of 650 mW for rare-earth-ion-doped microstructured channel waveguide lasers is achieved. The laser performance is compared to that of the same devices when pumping at 981 nm and lasing near 1025 nm.

waveguides with 5.4-dB optical gain

Laser experiments on 1.5at.%, 5at.%, and 8at.% thulium-gadolinium-lutetium-yttrium co-doped, buried, ridge-type channel waveguides in a monoclinic potassium double tungstate demonstrate a maximum slope efficiency of 70% and output powers of 300 mW at ~1.9 μm.

Highly efficient Yb 3+ -doped channel waveguide laser at 981 nm

We systematically characterize the Fabry-Pérot resonator. We derive the generic Airy distribution of a Fabry-Pérot resonator, which equals the internal resonance enhancement factor, and show that all related Airy distributions are obtained by simple scaling factors. We analyze the textbook approaches to the Fabry-Pérot resonator and point out various misconceptions. We verify that the sum of the mode profiles of all longitudinal modes is the fundamental physical function that characterizes the Fabry-Pérot resonator and generates the Airy distribution. Consequently, the resonator losses are quantified by the linewidths of the underlying Lorentzian lines and not by the measured Airy linewidth. Therefore, we introduce the Lorentzian finesse which provides the spectral resolution of the Lorentzian lines, whereas the usually considered Airy finesse only quantifies the performance of the Fabry-Pérot resonator as a scanning spectrometer. We also point out that the concepts of linewidth and finesse of the Airy distribution of a Fabry-Pérot resonator break down at low reflectivity. Furthermore, we show that a Fabry-Pérot resonator has no cut-off resonance wavelength. Finally, we investigate the influence of frequency-dependent mirror reflectivities, allowing for the direct calculation of its deformed mode profiles.

Efficient KY 1-x-y Gd x Lu y (WO 4 ) 2 :Tm 3+ channel waveguide lasers

A reliable and reproducible deposition process for the fabrication of Al₂O₃ waveguides with losses as low as 0.1 dB/cm has been developed. The thin films are grown at ~ 5 nm/min deposition rate and exhibit excellent thickness uniformity within 1% over 50times50 mm² area and no detectable OH^- incorporation. For applications of the Al₂O₃ films in compact, integrated optical devices, a high-quality channel waveguide fabrication process is utilized. Planar and channel propagation losses as low as 0.1 and 0.2 dB/cm, respectively, are demonstrated. For the development of active integrated optical functions, the implementation of rare-earth-ion doping is investigated by cosputtering of erbium during the Al₂O₃ layer growth. Dopant levels between 0.2-5times10²⁰ cm^-3 are studied. At Er³⁺ concentrations of interest for optical amplification, a lifetime of the ⁴I_13/2 level as long as 7 ms is measured. Gain measurements over 6.4-cm propagation length in a 700-nm-thick Al₂O₃:Er³⁺ channel waveguide result in net optical gain over a 41-nm-wide wavelength range between 1526-1567 nm with a maximum of 5.4 dB at 1533 nm.