Dirk Heinrich Dr. Ehm

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Archive | 2006

Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination

Dirk Heinrich Dr. Ehm; Dieter Kraus; Marcus Gerhardus Hendrikus Meijerink; Johannes Hubertus Josephina Moors; Stephan Müllender; Thomas Stein; Richard Versluis; Bastiaan Theodor Dr. Wolschrijn

Archive | 2008

Cleaning method for reflective optical element, particularly for soft X-ray and extreme ultraviolet wavelength range, and for operation of extreme ultraviolet lithography device, involves heating reflective optical element

Ton Bastein; Dirk Heinrich Dr. Ehm; Frits G.H.M. Gubbels; Norbertus Benedictus Koster; Marco G. H. Meijerink; Roel Moors; Michiel Nienoord; Peter J. Oprel; Michel Riepen; Annemieke van de Runstraat; Esther L.J. Van Soest-Vercammen; Thomas Stein; Arnold Storm

Archive | 2009

Optical surface's contamination removing method for extreme ultraviolet lithography, involves removing contaminations from optical surfaces to form polymerized protective layer, which protects optical surface against metallic compounds

Dirk Heinrich Dr. Ehm; Rik Jansen; Yousefi Dr. Mirvais; Johannes Hubertus Josephina Moors; Stefan Schmidt; Edwin te Sligte; Arnoldus Jan Storm; Jetske Stortelder

Archive | 2008

Extreme UV-projection illumination system for microlithographic imaging, has spectral filter detachably arranged in spectral aperture and/or aperture diaphragm and transparent for extreme UV-radiation

Vadim Yevgenyevich Banine; Günther Dengel; Dirk Heinrich Dr. Ehm; Johannes Hubertus Josephina Moors; A.M. Yakunin

Archive | 2014

Optisches Element und optisches System für die EUV-Lithographie sowie Verfahren zur Behandlung eines solchen optischen Elements

Hermanus Bekman; Dirk Heinrich Dr. Ehm; Jeroen Huijbregste; Arnoldus Jan Storm; Tina Graber; Irene Ament; Dries Smeets; Edwin te Sligte; Alexey Kuznetsov

Archive | 2009

Reinigung eines optischen Systems mittels Strahlungsenergie

Dirk Heinrich Dr. Ehm; Fokko Peter Wieringa; Bastiaan Theodor Dr. Wolschrijn; Johannes Hubertus Josephina Moors; Stefan Schmidt

Archive | 2008

Verfahren zur Messung der Ausgasung in EUV-Lithographievorrichtungen sowie EUV-Lithographievorrichtung

Dieter Kraus; Dirk Heinrich Dr. Ehm; Roel Moors

Archive | 2009

Cleaning module, particularly for extreme-ultraviolet lithography apparatus, has supply for molecular hydrogen, where atomic hydrogen generating device is provided

Dirk Heinrich Dr. Ehm; Julian Kaller

Archive | 2013

The optical element and optical system for EUV lithography, as well as methods for the treatment of such an optical element

Hermanus Bekman; Dirk Heinrich Dr. Ehm; Jeroen Huijbregste; Arnoldus Jan Storm; Tina Graber; Irene Ament; Dries Smeets; Edwin te Sligte; Alexey Kuznetsov

Archive | 2011