Arnoldus Jan Storm | Researchain

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Featured researches published by Arnoldus Jan Storm.

Archive | 2010

Particle cleaning of optical elements for microlithography

Dirk Heinrich Ehm; Arnoldus Jan Storm; Johannes Hubertus Josephina Moors; Almut Czap; Mona Nagel; Jacques Cor Johan Van der Donck; Jetske Stortelder; Marijn Sandtke; Maria Isabel Catalina Caballero; Luigi Scaccabarozzi

Archive | 2007

OPTICAL ARRANGEMENT AND EUV LITHOGRAPHY DEVICE WITH AT LEAST ONE HEATED OPTICAL ELEMENT, OPERATING METHODS, AND METHODS FOR CLEANING AS WELL AS FOR PROVIDING AN OPTICAL ELEMENT

Dirk Heinrich Ehm; Annemieke Van De Runstraat; Arnoldus Jan Storm; Thomas Stein; Marco G. H. Meijerink; A. G. Ton M. Bastein; Esther L.J. Van Soest-Vercammen; Norbertus Benedictus Koster; Frits G.H.M. Gubbels; Peter J. Oprel; Michiel Nienoord; Michel Riepen; Johannes Hubertus Josephina Moors

Archive | 2012

Verfahren zum Optimieren eines Schutzlagensystems für ein optisches Element, optisches Element und optisches System für die EUV-Lithographie

Dirk Heinrich Ehm; Arnoldus Jan Storm; Tina Graber; Jeroen Huijbregtse; Edwin te Sligte; Hermanus Hendricus Petrus Theodorus

Archive | 2009

Optical surface's contamination removing method for extreme ultraviolet lithography, involves removing contaminations from optical surfaces to form polymerized protective layer, which protects optical surface against metallic compounds

Dirk Heinrich Dr. Ehm; Rik Jansen; Yousefi Dr. Mirvais; Johannes Hubertus Josephina Moors; Stefan Schmidt; Edwin te Sligte; Arnoldus Jan Storm; Jetske Stortelder

Archive | 2014

Optisches Element und optisches System für die EUV-Lithographie sowie Verfahren zur Behandlung eines solchen optischen Elements

Hermanus Bekman; Dirk Heinrich Dr. Ehm; Jeroen Huijbregste; Arnoldus Jan Storm; Tina Graber; Irene Ament; Dries Smeets; Edwin te Sligte; Alexey Kuznetsov

Archive | 2013

Method for cleaning optical component of extreme-UV (EUV) projection exposure system, involves operating projection exposure system in presence of gas with work light so that work light ions are produced to clean optical component

Ardjan De Jong; Dirk Heinrich Ehm; Arnoldus Jan Storm; Maarten van Kampen; Michel van Putten; Timo Huijser; Stefan-Wolfgang Schmidt; Alisia Williams-Peters; Edwin te Sligte

Archive | 2013

Method for optimizing a protective layer system for an optical element, optical element and optical system for euv lithography

Dirk Heinrich Ehm; Jeroen Huijbregtse; Arnoldus Jan Storm; Sligte Edwin Te; Tina Graber; Hermanus Hendricus Petrus Theodorus Bekmann

Archive | 2014

Collector mirror for an euv-lithography device

Dirk Heinrich Ehm; Kampen Maarten Van; Arnoldus Jan Storm; Moritz Becker; Stefan-Wolfgang Schmidt; Jeroen Huijbregtse; Sligte Edwin Te; Rogier Verberk; Gisela von Blanckenhagen

Archive | 2013

Reflective optical element for optical system for extreme ultraviolet lithography apparatus, has multilayer system whose substrate side is provided with two layers made from amorphous silicon, silicon nitride, ruthenium and molybdenum

Dirk Heinrich Ehm; Maarten van Kampen; Arnoldus Jan Storm; Moritz Becker; Stefan-Wolfgang Schmidt; Jeroen Huijbregtse; Edwin te Sligte; Rogier Verberk; Gisela von Blanckenhagen

Archive | 2013

The optical element and optical system for EUV lithography, as well as methods for the treatment of such an optical element

Hermanus Bekman; Dirk Heinrich Dr. Ehm; Jeroen Huijbregste; Arnoldus Jan Storm; Tina Graber; Irene Ament; Dries Smeets; Edwin te Sligte; Alexey Kuznetsov

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