Johannes Hubertus Josephina Moors

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Featured researches published by Johannes Hubertus Josephina Moors.

Archive | 2013

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY, AS WELL AS REFLECTIVE OPTICAL ELEMENT WITH REDUCED CONTAMINATION

Dirk Heinrich Ehm; Stephan Muellender; Thomas Stein; Johannes Hubertus Josephina Moors; Dieter Kraus; Richard Versluis; Marcus Gerhardus Hendrikus Meijerink

Archive | 2004

Method and device for measuring contamination of a surface of a component of a lithographic apparatus

Ralph Kurt; Michael Cornelis Van Beek; Antonie Ellert Duisterwinkel; Erik Rene Kieft; Hans Meiling; Bastiaan Matthias Mertens; Johannes Hubertus Josephina Moors; Lucas Henricus Johannes Stevens

Archive | 2006

Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination

Dirk Heinrich Dr. Ehm; Dieter Kraus; Marcus Gerhardus Hendrikus Meijerink; Johannes Hubertus Josephina Moors; Stephan Müllender; Thomas Stein; Richard Versluis; Bastiaan Theodor Dr. Wolschrijn

Archive | 2010

Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor

Dirk Heinrich Ehm; Arnold Storm; Johannes Hubertus Josephina Moors; Thomas Stein; Edwin te Sligte

Archive | 2010

Particle cleaning of optical elements for microlithography

Dirk Heinrich Ehm; Arnoldus Jan Storm; Johannes Hubertus Josephina Moors; Almut Czap; Mona Nagel; Jacques Cor Johan Van der Donck; Jetske Stortelder; Marijn Sandtke; Maria Isabel Catalina Caballero; Luigi Scaccabarozzi

Archive | 2007

OPTICAL ARRANGEMENT AND EUV LITHOGRAPHY DEVICE WITH AT LEAST ONE HEATED OPTICAL ELEMENT, OPERATING METHODS, AND METHODS FOR CLEANING AS WELL AS FOR PROVIDING AN OPTICAL ELEMENT

Dirk Heinrich Ehm; Annemieke Van De Runstraat; Arnoldus Jan Storm; Thomas Stein; Marco G. H. Meijerink; A. G. Ton M. Bastein; Esther L.J. Van Soest-Vercammen; Norbertus Benedictus Koster; Frits G.H.M. Gubbels; Peter J. Oprel; Michiel Nienoord; Michel Riepen; Johannes Hubertus Josephina Moors

Archive | 2007

Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elements

Dirk Heinrich Ehm; Hermann Bieg; Hans-Juergen Mann; Stephan Muellender; Johannes Hubertus Josephina Moors

Archive | 2006

Cleaning method, apparatus and cleaning system

Dirk Heinrich Ehm; Johannes Hubertus Josephina Moors; Marcus Gerhardus Hendrikus Meijerink; Thomas Stein

Archive | 2009

Optical surface's contamination removing method for extreme ultraviolet lithography, involves removing contaminations from optical surfaces to form polymerized protective layer, which protects optical surface against metallic compounds

Dirk Heinrich Dr. Ehm; Rik Jansen; Yousefi Dr. Mirvais; Johannes Hubertus Josephina Moors; Stefan Schmidt; Edwin te Sligte; Arnoldus Jan Storm; Jetske Stortelder

Archive | 2008