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Edwin te Sligte

Carl Zeiss AG

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Publication

Featured researches published by Edwin te Sligte.

Archive | 2010

Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor

Dirk Heinrich Ehm; Arnold Storm; Johannes Hubertus Josephina Moors; Thomas Stein; Edwin te Sligte

Archive | 2012

Verfahren zum Optimieren eines Schutzlagensystems für ein optisches Element, optisches Element und optisches System für die EUV-Lithographie

Dirk Heinrich Ehm; Arnoldus Jan Storm; Tina Graber; Jeroen Huijbregtse; Edwin te Sligte; Hermanus Hendricus Petrus Theodorus

Archive | 2009

Optical surface's contamination removing method for extreme ultraviolet lithography, involves removing contaminations from optical surfaces to form polymerized protective layer, which protects optical surface against metallic compounds

Dirk Heinrich Dr. Ehm; Rik Jansen; Yousefi Dr. Mirvais; Johannes Hubertus Josephina Moors; Stefan Schmidt; Edwin te Sligte; Arnoldus Jan Storm; Jetske Stortelder

Archive | 2014

Optisches Element und optisches System für die EUV-Lithographie sowie Verfahren zur Behandlung eines solchen optischen Elements

Hermanus Bekman; Dirk Heinrich Dr. Ehm; Jeroen Huijbregste; Arnoldus Jan Storm; Tina Graber; Irene Ament; Dries Smeets; Edwin te Sligte; Alexey Kuznetsov

Archive | 2013

Method for cleaning optical component of extreme-UV (EUV) projection exposure system, involves operating projection exposure system in presence of gas with work light so that work light ions are produced to clean optical component

Ardjan De Jong; Dirk Heinrich Ehm; Arnoldus Jan Storm; Maarten van Kampen; Michel van Putten; Timo Huijser; Stefan-Wolfgang Schmidt; Alisia Williams-Peters; Edwin te Sligte

Archive | 2013

Method for removing a contamination layer from an optical surface and arrangement therefor

Dirk Heinrich Ehm; Arnold Storm; Johannes Hubertus Josephina Moors; Thomas Stein; Edwin te Sligte

Archive | 2016

EUV-Lithographiesystem und Betriebsverfahren dafür

Dirk Heinrich Ehm; Stefan-Wolfgang Schmidt; Edgar Osorio; Edwin te Sligte; Mark Zellenrath; Hella Logtenberg

Archive | 2015

Optische Anordnung für die EUV-Lithographie

Moritz Becker; Stefan-Wolfgang Schmidt; Dirk Heinrich Ehm; Edwin te Sligte

Archive | 2015

Optische Anordnung für die EUV-Lithographie An optical device for EUV lithography

Moritz Becker; Stefan-Wolfgang Schmidt; Dirk Heinrich Ehm; Edwin te Sligte

Archive | 2014

Optical arrangement for EUV lithography

Moritz Becker; Stefan-Wolfgang Schmidt; Dirk Heinrich Ehm; Edwin te Sligte

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Collaboration

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Dirk Heinrich Ehm

Carl Zeiss AG

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Arnoldus Jan Storm

Carl Zeiss AG

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Stefan-Wolfgang Schmidt

Carl Zeiss AG

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Moritz Becker

Carl Zeiss AG

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Tina Graber

Carl Zeiss AG

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Dirk Heinrich Dr. Ehm

Carl Zeiss AG

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Johannes Hubertus Josephina Moors

Carl Zeiss AG

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Alexey Kuznetsov

Carl Zeiss AG

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Arnold Storm

Carl Zeiss AG

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Dries Smeets

Carl Zeiss AG

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