Dong-Ryul Chang
Samsung
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Publication
Featured researches published by Dong-Ryul Chang.
international semiconductor conference | 2008
Byoung-Chul Park; Sung-young Lee; Dong-Ryul Chang; Kee-In Bang; Sung-Jun Kim; Sang-Bae Yi; Eunseung Jung
In high voltage transistor (HVT), device characteristics could be affected by little changes of doping concentration or parasitic charges due to low substrate doping concentrations. Humps caused by boron segregation in sub-threshold region of HVT make bad effects on device characteristics. In this paper, we have presented the novel Fermi leve controlled HVT (FCHVT) to simply eliminate hump effects.
international conference on solid-state and integrated circuits technology | 2008
Byoung-Chul Park; Sung-young Lee; Dong-Ryul Chang; Kee-In Bang; Sung-Jun Kim; Sang-Bae Yi; Eunseung Jung
In High Voltage Transistor (HVT), device characteristics could be affected by little changes of doping concentration or parasitic charges due to low substrate doping concentrations. Humps caused by boron segregation in sub-threshold region of HVT make bad effects on device characteristics. In this paper, we have presented the novel Fermi Level Controlled HVT (FCHVT) to simply eliminate hump effects.
Archive | 2007
Dong-Ryul Chang; Soo-Cheol Lee
Archive | 2004
Tae-jung Lee; Soo-Cheol Lee; Dong-Ryul Chang
Archive | 2007
Tae-jung Lee; Soo-Cheol Lee; Dong-Ryul Chang
Archive | 2006
Dong-Ryul Chang; Tae-jung Lee; Sung-Hoan Kim; Soo-Cheol Lee
Archive | 2009
Dong-Ryul Chang
Archive | 2006
Dong-Ryul Chang; Soo-Cheol Lee; Tae-jung Lee; Hyeon-cheol Kim
Archive | 2011
Dong-Ryul Chang; Hwa-sook Shin
Archive | 2014
Dong-Ryul Chang; Hwa-sook Shin; Hoon-Jin Bang