E. Meltchakov
Centre national de la recherche scientifique
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Featured researches published by E. Meltchakov.
New Journal of Physics | 2012
Charles Bourassin-Bouchet; S. de Rossi; J Wang; E. Meltchakov; Angelo Giglia; N Mahne; Stefano Nannarone; F. Delmotte
We report on the study of multilayer mirrors that were designed to compress extreme-ultraviolet pulses below 50?as. The mirrors were optimized in the time domain to obtain the desired pulse shape and duration when combined with a broadband hybrid filter. Moreover, they appeared to be very robust to environmental parameters, ensuring a pulse compression in various conditions. We manufactured the mirrors and characterized them on a synchrotron facility both in amplitude and in phase. A measurement of the latter was carried out using the photocurrent technique, which is the only method that allows one to access the mirrors absolute spectral phase. This led to a measurement of the offset induced by the mirrors on the carrier-envelope phase of attosecond pulses.
Advances in Optical Thin Films IV | 2011
E. Meltchakov; Ahmed Ziani; F. Auchère; Xueyan Zhang; Marc Roulliay; S. de Rossi; Ch. Bourassin-Bouchet; Arnaud Jérôme; F. Bridou; Françoise Varniere; F. Delmotte
We report on further development of three-material multilayer coatings made with a use of aluminum for the extreme ultra-violet (EUV) applications such as solar physics, high-order harmonic generation or synchrotron radiation. It was found that an introduction of refractory metal in Al-based periodic stack helps to reduce significantly an interfacial roughness and provides for a higher theoretical reflectance in the spectral range from 17 to 40 nm. The normal incidence reflectivity as high as 55 % at 17 nm, 50 % at 21 nm and 42 % at 30 nm was achieved with the new Al/Mo/SiC and Al/Mo/B4C multilayer mirrors, which have been optimized, fabricated and characterized with x-rays and synchrotron radiation. A good temporal and thermal stability of the tri-component Al-based multilayers has been observed over 3 years.
Optics Letters | 2014
Fadi Choueikani; Bruno Lagarde; Franck Delmotte; Michael Krumrey; F. Bridou; Muriel Thomasset; E. Meltchakov; François Polack
An alternate multilayer (AML) grating has been prepared by coating an ion etched lamellar grating with a B4C/Mo2C multilayer (ML) having a layer thickness close to the groove depth. Such a structure behaves as a 2D synthetic crystal and can reach very high efficiencies when the Bragg condition is satisfied. This AML coated grating has been characterized at the SOLEIL Metrology and Tests Beamline between 0.7 and 1.7 keV and at the four-crystal monochromator beamline of Physikalisch-Technische Bundesanstalt (PTB) at BESSY II between 1.75 and 3.4 keV. A peak diffraction efficiency of nearly 27% was measured at 2.2 keV. The measured efficiencies are well reproduced by numerical simulations made with the electromagnetic propagation code CARPEM. Such AML gratings, paired with a matched ML mirror, constitute efficient monochromators for intermediate energy photons. They will extend the accessible energy for many applications as x-ray absorption spectroscopy or x-ray magnetic circular dichroism experiments.
Proceedings of SPIE | 2013
Franck Delmotte; E. Meltchakov; Sébastien de Rossi; F. Bridou; Arnaud Jérôme; François Varnière; Raymond Mercier; F. Auchère; Xueyan Zhang; Bruno Borgo; C. Dumesnil; Serge François; Marc Roulliay; Udo Strauch
Since more than 20 years, Laboratoire Charles Fabry and Institut d’Astrophysique Spatiale are involved in development of the EUV multilayer coating for solar imaging. Previous instruments, such as the SOHO EIT and STEREO EUVI telescopes, employed the Mo/Si multilayer coatings, which offered at that time the best efficiency and stability. We present here recent results of the development of highly efficient EUV multilayers coatings at 17.4 nm and 30.4 nm for the Solar Orbiter mission. New multilayer structures, based on a combination of three materials including aluminum, have been optimized both theoretically and experimentally. We have succeeded to reduce interfacial roughness of Albased multilayers down to 0.5 nm via optimization of the multilayer design and the deposition process. The EUV peak reflectance of Al/Mo/SiC and Al/Mo/B4C multilayer coatings reaches 56% at 17.4 nm, the highest value reported up to now for this wavelength. We have also optimized specific bi-periodic structures that possess two reflection bands in the EUV range with high spectral selectivity. The EUV reflectivity of these Al-based dual-band coatings are compared with the Si/Mo/B4C baseline coating for Solar Orbiter. Since the stability of reflecting multilayer coating is an important issue for space missions, we have also studied the temporal stability as well as the resistivity of the coatings to thermal cycling and to proton irradiation. Experimental results confirm that Al/Mo/SiC and Al/Mo/B4C multilayer coatings are good candidates for the Solar Orbiter EUV imaging telescopes.
Optics Letters | 2015
Sébastien de Rossi; Charles Bourassin-Bouchet; E. Meltchakov; Angelo Giglia; Stefano Nannarone; Franck Delmotte
We propose a new model enabling the extraction of the phase of a multilayer mirror from photocurrent measurements in the soft x rays. In this range, the effects of the mean free path of the electrons inside the stack can no longer be neglected, which prevents the phase reconstruction by conventional photocurrent measurements. The new model takes into account this phenomenon and thus extends up to the x rays the applicability range of the technique. This approach has been validated through a numerical and experimental study of chromium/scandium multilayers used near 360 eV. To our knowledge, this work constitutes the first measurement of the phase of a multilayer mirror in the soft x-ray range.
Proceedings of SPIE | 2011
Ph. Troussel; D. Dennetiere; R. Rosch; Ch. Reverdin; H. Hartmann; F. Bridou; E. Meltchakov; F. Delmotte
With regards to the future Laser Megajoules french facility (LMJ), our laboratory is developing advanced time-resolved High Resolution X-ray Imaging (HRXI) systems to diagnose laser produced plasma. Shrapnel and X-ray loading on this laser imposes to place any HRXI as far away from the source as possible. Grazing incidence X-ray microscopes are the best solution to overpass this limitation. These imagers combine therefore grazing X-ray microscope and camera. We designed imaging diagnostics, mainly with a long working distance (> 50 cm) and high spatial resolution. All of them are composed of single or multi-toroïdal(s) mirror(s). To increase the bandwidth of reflectivity of all these mirrors, multilayer coatings have been deposited. We present mainly microscopes using non-periodic W/SiC multilayer coatings (Supermirrors), developed in collaboration with Institut dOptique. Supermirrors were designed for a first set of diagnostics to work at 0.7° grazing incidence. Secondly, we have implemented this supermirror on a Wolter-type microscope used at a smaller grazing incidence (0.6° angle) in order to increase the bandwidth of reflectivity up to 12 keV. Metrology for x-ray reflectance in the whole range on the synchrotron radiation facility BESSY II is also presented.
Optics Express | 2014
B. Emprin; Ph. Troussel; G. Soullié; Ph. Stemmler; P. Mercère; E. Meltchakov; Arnaud Jérôme; F. Delmotte
We present an experimental study and performance improvement of periodic and aperiodic Ni/SiC multilayer coatings. Periodic Ni/SiC multilayer mirrors have been coated and characterized by grazing incidence X-ray reflectometry at 8.048 keV (Cu Kα radiation) and by measurements at 3 keV and 5 keV on synchrotron radiation facilities. An interdiffusion effect is found between Ni and SiC layers. A two-material model, Ni(x)Si(y)/SiC, using a silicide instead of Ni, was used to fit the measurements. The addition of 0.6 nm W barrier layers at the interfaces allows a significant reduction of the interdiffusion between Ni and SiC. In order to obtain a specific reflectivity profile in the 2 - 8 keV energy range, we have designed and coated aperiodic multilayer mirrors by using Ni/SiC with and without W barrier layers. The experimental reflectivity profiles as a function of the photon energy were measured on a synchrotron radiation facility in both cases. Adding W barrier layers in Ni/SiC multilayers provides a better precision on the layer thicknesses and a very good agreement between the experimental data and the targeted spectral profile.
Proceedings of SPIE | 2013
E. Meltchakov; S. de Rossi; Raymond Mercier; Françoise Varniere; Arnaud Jérôme; F. Auchère; Xueyan Zhang; Marc Roulliay; F. Delmotte
We report on further development of reflective multilayer coatings containing aluminum as low absorbing material for the extreme ultra-violet (EUV) applications, in particular for solar physics. Optimizations of the multilayer design and deposition process have allowed us to produce Al-based multilayers having relatively low interface roughness and record EUV reflectances in the range from 17 to 40 nm. The peak reflectance values of 56 % at 17.5 nm, 50 % at around 21 nm, and 42 % at 32 nm were achieved with new three-material multilayers Al/Mo/SiC and Al/Mo/B4C at near-normal incidence. We observe a good temporal stability of optical parameters of the multilayers over the period of 4 years. Moreover, the multilayer structure remains stable upon annealing at 100 °C in air during several weeks. We will discuss the optical properties of more complex Al-based systems with regard to the design of multilayer coatings that reflect more than one wavelength and reject some others within the spectral range from 17 to 40 nm. Such multichannel systems with enhanced reflectance and selectivity would provide a further advance in optical performance and compactness of EUV solar imaging instruments. We will discuss general aspects of design, optimization and fabrication of single- and multi-channel multilayer mirrors made with the use of aluminum. We will present recent results on the EUV reflectivity of multilayer coatings based on the Al/Mo/SiC and Al/Mo/B4C material combinations. Al-based multilayer systems are proposed as optical coatings in EUV telescopes of future space missions and in other EUV applications.
Seventh International Conference on Thin Film Physics and Applications | 2010
F. Delmotte; S. de Rossi; Charles Bourassin-Bouchet; E. Meltchakov; A. Ziani; Fadi Choueikani; F. Bridou; Arnaud Jérôme; Françoise Varniere
In this paper, we present a brief history of EUV multilayer mirrors and recent results achieved at Institut dOptique in the fields of space science and ultra-fast pulses. Concerning space science, we present two solutions to improve reflectivity of EUV multilayer for solar imaging: three material multilayers and Al-based multilayers. Concerning attosecond pulses, we demonstrate the possibility to realize multilayer mirrors for an efficient transport of high harmonics on a broad energy band with high efficiency.
Journal of Physics: Conference Series | 2016
S R Uglov; V V Kaplin; A S Kubankin; J.-M. André; K. Le Guen; P. Jonnard; S. de Rossi; E. Meltchakov; F. Delmotte
The results of experimental investigation of parametric radiation generated by 5.7 MeV electrons in a multilayer structure consisting of 100 Cr/Sc bi-layers deposited on a Si3N4 membrane are presented. The multilayer structure was specially created for generation of parametric radiation with photon energy in water-window spectral range. First test measurements of angular distributions of radiation have been done and discussed.