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Dive into the research topics where F. Delmotte is active.

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Featured researches published by F. Delmotte.


Proceedings of SPIE | 2012

The EUI instrument on board the Solar Orbiter mission: from breadboard and prototypes to instrument model validation

Jean-Philippe Halain; Pierre Rochus; Etienne Renotte; Thierry Appourchaux; David Berghmans; Louise K. Harra; U. Schühle; Werner Schmutz; F. Auchère; Andrei Zhukov; C. Dumesnil; F. Delmotte; T. Kennedy; Raymond Mercier; D. Pfiffner; Laurence Rossi; J. Tandy; A. BenMoussa; Phyllis Smith

The Solar Orbiter mission will explore the connection between the Sun and its heliosphere, taking advantage of an orbit approaching the Sun at 0.28 AU. As part of this mission, the Extreme Ultraviolet Imager (EUI) will provide full-sun and high-resolution image sequences of the solar atmosphere at selected spectral emission lines in the extreme and vacuum ultraviolet. To achieve the required scientific performances under the challenging constraints of the Solar Orbiter mission it was required to further develop existing technologies. As part of this development, and of its maturation of technology readiness, a set of breadboard and prototypes of critical subsystems have thus been realized to improve the overall instrument design. The EUI instrument architecture, its major components and sub-systems are described with their driving constraints and the expected performances based on the breadboard and prototype results. The instrument verification and qualification plan will also be discussed. We present the thermal and mechanical model validation, the instrument test campaign with the structural-thermal model (STM), followed by the other instrument models in advance of the flight instrument manufacturing and AIT campaign.


Advances in Optical Thin Films IV | 2011

EUV reflectivity and stability of tri-component Al- based multilayers

E. Meltchakov; Ahmed Ziani; F. Auchère; Xueyan Zhang; Marc Roulliay; S. de Rossi; Ch. Bourassin-Bouchet; Arnaud Jérôme; F. Bridou; Françoise Varniere; F. Delmotte

We report on further development of three-material multilayer coatings made with a use of aluminum for the extreme ultra-violet (EUV) applications such as solar physics, high-order harmonic generation or synchrotron radiation. It was found that an introduction of refractory metal in Al-based periodic stack helps to reduce significantly an interfacial roughness and provides for a higher theoretical reflectance in the spectral range from 17 to 40 nm. The normal incidence reflectivity as high as 55 % at 17 nm, 50 % at 21 nm and 42 % at 30 nm was achieved with the new Al/Mo/SiC and Al/Mo/B4C multilayer mirrors, which have been optimized, fabricated and characterized with x-rays and synchrotron radiation. A good temporal and thermal stability of the tri-component Al-based multilayers has been observed over 3 years.


Proceedings of SPIE, the International Society for Optical Engineering | 2009

Optical, chemical, and depth characterization of Al/SiC periodic multilayers

Philippe Jonnard; K. Le Guen; M.-H. Hu; Jean-Michel André; E. Meltchakov; Christophe Hecquet; F. Delmotte; A. Galtayries

We present the characterization of Al/SiC periodic multilayers designed for optical applications. In some samples, a thin layer of W or Mo is added at the SiC-on-Al interfaces. We use x-ray reflectivity (XRR) in order to determine the parameters of the stacks, i.e. thickness and roughness of all the layers. We have performed x-ray emission spectroscopy (XES) to identify the chemical state of the Al and Si atoms present within the structure from an analysis of the shape of the Al Kβ and Si Kβ emission bands. Finally, time of flight secondary ion mass spectrometry (ToF-SIMS) is used to obtain the depth profile of the different elements present within the studied stacks. A fit of the XRR curves shows that the Al/SiC multilayer present large interfacial roughness (up to 2.8 nm), which is decreased considerably (down to 1 nm or less) when the refractory metal layers are introduced in the periodic structure. The combination of XES and ToFSIMS allows us to conclude that in these systems the roughness is a purely geometrical parameter and not related to chemical interfacial reactions.


Optics Express | 2011

Duration of ultrashort pulses in the presence of spatio-temporal coupling

Charles Bourassin-Bouchet; M. Stephens; S. de Rossi; F. Delmotte; Pierre Chavel

We report on a simple method allowing one to decompose the duration of arbitrary ultrashort light pulses, potentially distorted by space-time coupling, into four elementary durations. Such a decomposition shows that, in linear optics, a spatio-temporal pulse can be stretched with respect to its Fourier limit by only three independent phenomena: nonlinear frequency dependence of the spectral phase over the whole spatial extent of the pulse, spectral amplitude inhomogeneities in space, and spectral phase inhomogeneities in space. We illustrate such a decomposition using numerical simulations of complex spatio-temporal femtosecond and attosecond pulses. Finally we show that the contribution of two of these three effects to the pulse duration is measurable without any spectral phase characterization.


Applied Optics | 2002

X-ray multilayer monochromator with enhanced performance

Jean-Michel André; Rabah Benbalagh; R. Barchewitz; M.F. Ravet; Alain Raynal; F. Delmotte; F. Bridou; Gwénäelle Julié; Alain Bosseboeuf; René Laval; G. Soullie; Christian Remond; Michel Fialin

An x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching. The performance of this new monochromator at photon energies near 1500 eV is shown.


Optics Express | 2013

How to focus an attosecond pulse

Charles Bourassin-Bouchet; M. M. Mang; F. Delmotte; Pierre Chavel; S. de Rossi

Attosecond experiments involving focusing of attosecond light pulses can suffer from a spread of the attosecond radiation both in space and time due to optical aberrations. We present a detailed numerical study of the distortions induced in the most common focusing geometries that make use of parabolic, spherical, toroidal and ellipsoidal mirrors. We deduce the consequences on the pulse duration and possible issues that could arise in applications of attosecond pulses. This should serve as a guideline for setting up attosecond focusing optics.


Review of Scientific Instruments | 2014

Absolute radiant power measurement for the Au M lines of laser-plasma using a calibrated broadband soft X-ray spectrometer with flat-spectral response

Ph. Troussel; Bruno Villette; B. Emprin; G. Oudot; V. Tassin; F. Bridou; F. Delmotte; M. Krumrey

CEA implemented an absolutely calibrated broadband soft X-ray spectrometer called DMX on the Omega laser facility at the Laboratory for Laser Energetics (LLE) in 1999 to measure radiant power and spectral distribution of the radiation of the Au plasma. The DMX spectrometer is composed of 20 channels covering the spectral range from 50 eV to 20 keV. The channels for energies below 1.5 keV combine a mirror and a filter with a coaxial photo-emissive detector. For the channels above 5 keV the photoemissive detector is replaced by a conductive detector. The intermediate energy channels (1.5 keV < photon energy < 5 keV) use only a filter and a coaxial detector. A further improvement of DMX consists in flat-response X-ray channels for a precise absolute measurement of the photon flux in the photon energy range from 0.1 keV to 6 keV. Such channels are equipped with a filter, a Multilayer Mirror (MLM), and a coaxial detector. We present as an example the development of channel for the gold M emission lines in the photon energy range from 2 keV to 4 keV which has been successfully used on the OMEGA laser facility. The results of the radiant power measurements with the new MLM channel and with the usual channel composed of a thin titanium filter and a coaxial detector (without mirror) are compared. All elements of the channel have been calibrated in the laboratory of the Physikalisch-Technische Bundesanstalt, Germanys National Metrology Institute, at the synchrotron radiation facility BESSY II in Berlin using dedicated well established and validated methods.


Proceedings of SPIE | 2014

The extreme UV imager of solar orbiter: from detailed design to flight model

Jean-Philippe Halain; P. Rochus; Etienne Renotte; F. Auchère; David Berghmans; Louise K. Harra; U. Schühle; W. Schmutz; Andrei Zhukov; R. Aznar Cuadrado; F. Delmotte; C. Dumesnil; M. Gyo; T. Kennedy; Raymond Mercier; F. Verbeeck; Michel Thomé; Klaus Heerlein; Aline Hermans; Laurent Jacques; Alexandra Mazzoli; Stefan Meining; Laurence Rossi; J. Tandy; P. Smith; B. Winter

The Extreme Ultraviolet Imager (EUI) on-board the Solar Orbiter mission will provide full-sun and high-resolution image sequences of the solar atmosphere at selected spectral emission lines in the extreme and vacuum ultraviolet. After the breadboarding and prototyping activities that focused on key technologies, the EUI project has completed the design phase and has started the final manufacturing of the instrument and its validation. The EUI instrument has successfully passed its Critical Design Review (CDR). The process validated the detailed design of the Optical Bench unit and of its sub-units (entrance baffles, doors, mirrors, camera, and filter wheel mechanisms), and of the Electronic Box unit. In the same timeframe, the Structural and Thermal Model (STM) test campaign of the two units have been achieved, and allowed to correlate the associated mathematical models. The lessons learned from STM and the detailed design served as input to release the manufacturing of the Qualification Model (QM) and of the Flight Model (FM). The QM will serve to qualify the instrument units and sub-units, in advance of the FM acceptance tests and final on-ground calibration.


Optics Express | 2014

X-ray broadband Ni/SiC multilayers: improvement with W barrier layers

B. Emprin; Ph. Troussel; G. Soullié; Ph. Stemmler; P. Mercère; E. Meltchakov; Arnaud Jérôme; F. Delmotte

We present an experimental study and performance improvement of periodic and aperiodic Ni/SiC multilayer coatings. Periodic Ni/SiC multilayer mirrors have been coated and characterized by grazing incidence X-ray reflectometry at 8.048 keV (Cu Kα radiation) and by measurements at 3 keV and 5 keV on synchrotron radiation facilities. An interdiffusion effect is found between Ni and SiC layers. A two-material model, Ni(x)Si(y)/SiC, using a silicide instead of Ni, was used to fit the measurements. The addition of 0.6 nm W barrier layers at the interfaces allows a significant reduction of the interdiffusion between Ni and SiC. In order to obtain a specific reflectivity profile in the 2 - 8 keV energy range, we have designed and coated aperiodic multilayer mirrors by using Ni/SiC with and without W barrier layers. The experimental reflectivity profiles as a function of the photon energy were measured on a synchrotron radiation facility in both cases. Adding W barrier layers in Ni/SiC multilayers provides a better precision on the layer thicknesses and a very good agreement between the experimental data and the targeted spectral profile.


Proceedings of SPIE | 2013

Single and multi-channel Al-based multilayer systems for space applications in EUV range

E. Meltchakov; S. de Rossi; Raymond Mercier; Françoise Varniere; Arnaud Jérôme; F. Auchère; Xueyan Zhang; Marc Roulliay; F. Delmotte

We report on further development of reflective multilayer coatings containing aluminum as low absorbing material for the extreme ultra-violet (EUV) applications, in particular for solar physics. Optimizations of the multilayer design and deposition process have allowed us to produce Al-based multilayers having relatively low interface roughness and record EUV reflectances in the range from 17 to 40 nm. The peak reflectance values of 56 % at 17.5 nm, 50 % at around 21 nm, and 42 % at 32 nm were achieved with new three-material multilayers Al/Mo/SiC and Al/Mo/B4C at near-normal incidence. We observe a good temporal stability of optical parameters of the multilayers over the period of 4 years. Moreover, the multilayer structure remains stable upon annealing at 100 °C in air during several weeks. We will discuss the optical properties of more complex Al-based systems with regard to the design of multilayer coatings that reflect more than one wavelength and reject some others within the spectral range from 17 to 40 nm. Such multichannel systems with enhanced reflectance and selectivity would provide a further advance in optical performance and compactness of EUV solar imaging instruments. We will discuss general aspects of design, optimization and fabrication of single- and multi-channel multilayer mirrors made with the use of aluminum. We will present recent results on the EUV reflectivity of multilayer coatings based on the Al/Mo/SiC and Al/Mo/B4C material combinations. Al-based multilayer systems are proposed as optical coatings in EUV telescopes of future space missions and in other EUV applications.

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F. Bridou

Centre national de la recherche scientifique

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M.F. Ravet

Centre national de la recherche scientifique

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S. de Rossi

Centre national de la recherche scientifique

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Arnaud Jérôme

Centre national de la recherche scientifique

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E. Meltchakov

Centre national de la recherche scientifique

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J. Gautier

Centre national de la recherche scientifique

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Françoise Varniere

Centre national de la recherche scientifique

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F. Auchère

University of Paris-Sud

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Charles Bourassin-Bouchet

Centre national de la recherche scientifique

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