Françoise Varniere

X-ray–ultraviolet beam splitters for the Michelson interferometer

With the aim of realizing a Michelson interferometer working at 13.9 nm, we have developed a symmetrical beam splitter with multilayers deposited on the front and back sides of a silicon nitride membrane. On the basis of the experimental optical properties of the membrane, simulations have been performed to define the multilayer structure that provides the highest reflectivity-transmission product. Optimized Mo-Si multilayers have been successfully deposited on both sides of t he membrane by use of the ion-beam sputtering technique, with a thickness-period reproducibility of 0.1 nm. Measurements by means of synchrotron radiation at 13.9 nm and at an angle of 45 degrees provide a reflectivity of 14.2% and a transmission of 15.2% for a 60% s-polarized light, close to the simulated values. Such a beam splitter has been used for x-ray laser Michelson interferometry at 13.9 nm. The first interferogram is discussed.

EUV reflectivity and stability of tri-component Al- based multilayers

We report on further development of three-material multilayer coatings made with a use of aluminum for the extreme ultra-violet (EUV) applications such as solar physics, high-order harmonic generation or synchrotron radiation. It was found that an introduction of refractory metal in Al-based periodic stack helps to reduce significantly an interfacial roughness and provides for a higher theoretical reflectance in the spectral range from 17 to 40 nm. The normal incidence reflectivity as high as 55 % at 17 nm, 50 % at 21 nm and 42 % at 30 nm was achieved with the new Al/Mo/SiC and Al/Mo/B4C multilayer mirrors, which have been optimized, fabricated and characterized with x-rays and synchrotron radiation. A good temporal and thermal stability of the tri-component Al-based multilayers has been observed over 3 years.

Design, conception, and metrology of EUV mirrors for aggressive environments

The development of new high power EUV sources and EUV space imaging requires optics having specific properties which depend on applications and operating conditions. These both applications are very different in the working multilayers environment. For the high power sources, multilayers are submitted to short pulses with high energy peak whereas, for the space imaging, multilayers are submitted to continuous flux with low level. Moreover photon energy and environment for both applications may be different. The environment may affect structure and top layer contamination when optics are stored, handled, mounted on the final device and finally operating. Main environmental parameters investigated are temperature and humidity variation. One objective is the optimisation of multilayer coatings to offer the highest resistance under photonic, ionic fluxes and temperature cycle. This means that interfacial diffusion between thin layers and degradation of the capping layers have to be avoided or reduced. The present study relies with designing, depositing and testing different structures of multilayer coatings in order to minimise the influence of the environment. Multilayer coatings based on molybdenum, silicon and silicon carbide materials have been deposited by magnetron sputtering on silicon and zerodur substrates. Samples were submitted to radiations emitted by an EUV source at wavelength closed to 13.5 nm. Furthermore they were also submitted to thermal cycles and annealing under warm humidity in the aim to simulate extremes storage or handling conditions as space missions conditions. The damages and the performance of the multilayers were evaluated by using grazing incidence reflectometry at 0.154 nm and EUV reflectometry at the operating wavelength. After a presentation of the multilayer design, deposition and metrology tools, we will describe the different environmental effects on the coatings to take in care during EUV source exposure, handling and storage conditions. First results on multilayers performances to EUV source exposure and space specification tests are presented. Main damages studies were on annealing, thermal cycling and warm humidity.

Experimental study of Cr∕Sc multilayer mirrors for the nitrogen Kα-emission line

The authors present an experimental study of Cr∕Sc multilayer mirrors optimized for the detection of the nitrogen Kα-emission line (λ=3.16nm) at a grazing incidence around 23°, for electron probe microanalysis applications. The multilayers were deposited onto silicon substrates using a dc magnetron sputtering system. They were characterized with grazing incidence copper Kα x-ray reflectometry and atomic force microscopy, as well as with at-wavelength reflectometry using synchrotron radiation. These various characterization methods pointed out that the interfacial roughness of these multilayers increases drastically with the number of bilayers. Growth parameters were then optimized, and it is shown that the structure and reflectivity of such multilayers can be considerably improved by optimizing the sputter gas pressure during the deposition process. Reflectivity higher than 37% were measured at 22.3° grazing angle for the nitrogen Kα-emission line.

Single and multi-channel Al-based multilayer systems for space applications in EUV range

We report on further development of reflective multilayer coatings containing aluminum as low absorbing material for the extreme ultra-violet (EUV) applications, in particular for solar physics. Optimizations of the multilayer design and deposition process have allowed us to produce Al-based multilayers having relatively low interface roughness and record EUV reflectances in the range from 17 to 40 nm. The peak reflectance values of 56 % at 17.5 nm, 50 % at around 21 nm, and 42 % at 32 nm were achieved with new three-material multilayers Al/Mo/SiC and Al/Mo/B4C at near-normal incidence. We observe a good temporal stability of optical parameters of the multilayers over the period of 4 years. Moreover, the multilayer structure remains stable upon annealing at 100 °C in air during several weeks. We will discuss the optical properties of more complex Al-based systems with regard to the design of multilayer coatings that reflect more than one wavelength and reject some others within the spectral range from 17 to 40 nm. Such multichannel systems with enhanced reflectance and selectivity would provide a further advance in optical performance and compactness of EUV solar imaging instruments. We will discuss general aspects of design, optimization and fabrication of single- and multi-channel multilayer mirrors made with the use of aluminum. We will present recent results on the EUV reflectivity of multilayer coatings based on the Al/Mo/SiC and Al/Mo/B4C material combinations. Al-based multilayer systems are proposed as optical coatings in EUV telescopes of future space missions and in other EUV applications.

Al-based multilayer mirrors for Extreme UV applications

We present recent advances in Al-based multilayer mirrors for EUV applications including high efficiency narrowband, dual-band and broadband mirrors. Applications to solar physics and to ultrafast dynamics with coherent EUV sources will be discussed.

Multilayer Mirrors for Ultrafast Dynamics With Coherent Sources

Laboratoire Charles Fabry develops multilayer mirrors for University of Paris-Saclay state-of-the-art coherent XUV sources. We report on the recent advances in multilayer optics including mirrors for as/fs delay line and for a 10-100 eV polarizer.

Multilayer optics for coherent EUV/X-ray laser sources

After a brief review of recent results achieved at Laboratoire Charles Fabry concerning high reflectivity mirrors, mirrors with enhanced spectral purity and broadband mirrors, we describe a new approach to design high efficiency multilayer mirrors for application on a broad spectral range. The main idea is to use 2 “spacer” materials (Aluminum and Scandium) in combination with a third material (Boron carbide or Silicon Carbide). We present several examples of design optimization using such multilayers. Finally, we show the first preliminary experimental results with Al/Sc/B4C and Al/Sc/SiC multilayers deposited by ion beam sputtering.

Three-material Multilayers for Dual-band and Broadband Extreme UV mirrors

We will present recent advances in the design and deposition of EUV multilayer mirrors. Efficient control of the spectral shape has been achieved by using three material structures. Applications to dual-band and broadband mirrors will be discussed.